Patents by Inventor Goroku Shimoma

Goroku Shimoma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and scanning electron microscope for measuring width of material on sample
    Patent number: 7385196
    Abstract: A width-measurement method of reducing or eliminating an error in measurement of a width of an object on a sample resulting from the dimension of the beam diameter, wherein a width-measured value of the object to be width-measured which has been obtained on the basis of a secondary signal obtained from secondary particles emitted from the sample having thereon the object to be width-measured is corrected with a value with respect to a dimension value of a beam diameter.
    Type: Grant
    Filed: August 5, 2004
    Date of Patent: June 10, 2008
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Goroku Shimoma, Tadashi Otaka, Mitsugu Sato, Hideo Todokoro, Shunichi Watanabe, Tadanori Takahashi, Masahiro Kawawa, Masanori Gunji, Terumichi Nishino
  • Method and scanning electron microscope for measuring width of material on sample
    Publication number: 20050006581
    Abstract: A width-measurement method of reducing or eliminating an error in measurement of a width of an object on a sample resulting from the dimension of the beam diameter, wherein a width-measured value of the object to be width-measured which has been obtained on the basis of a secondary signal obtained from secondary particles emitted from the sample having thereon the object to be width-measured is corrected with a value with respect to a dimension value of a beam diameter.
    Type: Application
    Filed: August 5, 2004
    Publication date: January 13, 2005
    Inventors: Goroku Shimoma, Tadashi Otaka, Mitsugu Sato, Hideo Todokoro, Shunichi Watanabe, Tadanori Takahashi, Masahiro Kawawa, Masanori Gunji, Terumichi Nishino
  • Method and scanning electron microscope for measuring dimension of material on sample
    Patent number: 6791084
    Abstract: A width-measurement method of reducing or eliminating an error in measurement of a width of an object on a sample resulting from the dimension of the beam diameter, wherein a width-measured value of the object to be width-measured which has been obtained on the basis of a secondary signal obtained from secondary particles emitted from the sample having thereon the object to be width-measured is corrected with a value with respect to a dimension value of a beam diameter.
    Type: Grant
    Filed: September 19, 2002
    Date of Patent: September 14, 2004
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Goroku Shimoma, Tadashi Otaka, Mitsugu Sato, Hideo Todokoro, Shunichi Watanabe, Tadanori Takahashi, Masahiro Kawawa, Masanori Gunji, Terumichi Nishino
  • Method and scanning electron microscope for measuring width of material on sample
    Publication number: 20030071214
    Abstract: A width-measurement method of reducing or eliminating an error in measurement of a width of an object on a sample resulting from the dimension of the beam diameter, wherein a width-measured value of the object to be width-measured which has been obtained on the basis of a secondary signal obtained from secondary particles emitted from the sample having thereon the object to be width-measured is corrected with a value with respect to a dimension value of a beam diameter.
    Type: Application
    Filed: September 19, 2002
    Publication date: April 17, 2003
    Inventors: Goroku Shimoma, Tadashi Otaka, Mitsugu Sato, Hideo Todokoro, Shunichi Watanabe, Tadanori Takahashi, Masahiro Kawawa, Masanori Gunji, Terumichi Nishino
  • Resolving power evaluation method and specimen for electron microscope
    Patent number: 6166380
    Abstract: An electron microscope resolving power evaluation method for evaluating performance of a scanning electron microscope without resorting to visual sensory analysis for minimizing a difference in deterioration with age and in performance among individual scanning electron microscopes. A specimen is prepared by overlaying materials having different emission coefficients of secondary charged particles such as secondary electrons, backscattered electrons, transmitted electrons, etc., a cross-section including an overlaid material part of thin-film layers having known dimensions is mirror-finished, data of a scanning electron microscopical image of the cross-section, including the overlaid material part is obtained, and then the resolving power performance of the scanning electron microscope is evaluated quantitatively by means of frequency analysis, etc.
    Type: Grant
    Filed: May 1, 1998
    Date of Patent: December 26, 2000
    Assignee: Hitachi, Ltd.
    Inventors: Taiji Kitagawa, Mitsugu Sato, Goroku Shimoma, Tadanori Takahashi, Naoto Yoshida, Masayuki Yukii, Takanori Ninomiya, Tatsuo Horiuchi, Keisuke Kawame