Abstract: In a lithographic apparatus, an illumination mode is set using a field mirror that includes a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. A base illumination mode is selected from a set of predetermined illumination modes and the movable facets are set to effect that mode. In order to adjust an imaging parameter, a fraction of the movable facets are set to different positions. The determination of which facets to set to different positions is based on summing the effects of setting each facet to a different position.

Abstract: An illumination system includes a field-facet mirror-device and a pupil mirror configured to condition a beam of radiation incident on the field-facet mirror-device. The field-facet mirror-device includes reflective field facets movable between first and second orientations relative to the incident beam. The field facets in their first orientations are effective to reflect the incident radiation towards respective reflective pupil facets so as to form part of a conditioned beam reflected from the pupil-facet mirror-device. The field facets in their second orientations are effective to reflect the incident radiation onto respective areas of the pupil-facet mirror-device designated as beam dump areas. The areas are arranged to prevent radiation incident on the areas from forming part of the conditioned beam and are arranged between the limits of an annular area on the pupil-facet mirror-device effective to define the inner and outer regions of the conditioned beam reflected from the pupil-facet mirror-device.

Abstract: In an EUV (extreme ultraviolet) lithography apparatus, an illumination system includes a multifaceted field mirror and a multifaceted pupil mirror. A field facet mirror within mirror focuses EUV radiation onto a particular associated pupil facet mirror, from where it is directed to a target area. Each field facet mirror is modified to scatter unwanted DUV (deep ultraviolet) radiation into a range of directions. The majority of DUV falls onto neighboring pupil facet mirrors within the pupil mirrors, so that the amount of DUV radiation reaching target E is suppressed in comparison to the wanted EUV radiation. Because the distance between mirrors is much greater than the width of an individual pupil facet mirror, good DUV suppression can be achieved with only a narrow scattering angle. Absorption of EUV radiation in the scattering layer can be minimized.

Abstract: In a lithographic apparatus, an illumination mode is set using a field mirror comprising a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. In the event that a field facet mirror is defective and cannot be set to a desired position, another of the movable facet mirrors is set to a corrective position, different than its desired position, to at least partially ameliorate a deleterious effect of the defective facet mirror.

Abstract: An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.

Abstract: An optical apparatus has a moveable reflective element and associated actuator. The actuator includes a first magnet which is connected to the moveable reflective element such that movement of the first magnet will cause the moveable reflective element to move, and a second magnet which is connected to a motor such that operation of the motor will cause the second magnet to move. The second magnet is positioned relative to the first magnet such that moving the second magnet will cause the first magnet to move.

Abstract: An illumination system having a plurality of reflective elements, the reflective elements being movable between different orientations which direct radiation towards different locations in a pupil plane, thereby forming different illumination modes. Each reflective element is moveable to a first orientation in which it directs radiation to a location in an inner illumination location group, to a second orientation in which it directs radiation to a location in an intermediate illumination location group, and to a third orientation in which it directs radiation to a location in an outer illumination location group.

Abstract: An array of reflective elements in which at least one of the reflective elements is mounted on a mounting which comprises a rod at least partially located within a sleeve. A first end of the rod is fixed to a first end of the sleeve and a second end of the rod is moveable, the sleeve including a first resiliently flexible portion which is configured to bend in order to allow the movement of the second end of the rod to take place, wherein the reflective element is mounted at the first end of the sleeve such that bending of the sleeve causes rotation of the reflective element.

Abstract: An illumination system of a lithographic apparatus includes a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations, the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation, which directs radiation towards a first location the pupil plane, and a second orientation, which directs radiation towards a second location in the pupil plane. The first orientation and the second orientation of the reflective element are defined by end stops.

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device is configured to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The apparatus includes a heater arrangement that includes an electron beam generator configured to generate an electron beam, and an electron beam guide arrangement configured to guide the electron beam onto an optical element of the lithographic apparatus. The optical element forms a part of the illumination system or the projection system which, in use, is traversed by the radiation beam. The heater arrangement is controllable to provide a distribution of heat on the optical element by deflection of the electron beam.

Abstract: An actuator system is provided that is configured to move a component relative to a base of the actuator system. The actuator system may include first and second actuating elements, each including two sections of material that are joined to each other and have different coefficients of thermal expansion. The two actuating elements may be configured such that if the temperature of one is increased it applies a force on the component in a direction that is opposite to the force applied by the other actuating element if its temperature is increased. The actuator system may further include at least one power supply configured to provide independently controllable heating to the first and second actuating elements.

Abstract: A display device is manufactured having a display with an auxiliary plate. The display window (3) and the auxiliary plate (15) are oriented at an angle of tilt &agr;1, preferably substantially vertically, the volume in between the display window and auxiliary plate is filed up to a selected level height (h) with uncured resin, a seal (17) and an opening (18) being provided at or near the highest point. Thereafter the display window is reoriented to a more horizontal position (smaller angle of tilt &agr;2) the auxiliary plate being positioned on top of the display window inducing a flow v of curable material (16) towards the opening (18), and when the resin has reached the opening the resin near the opening is plugged, where after the angle of tilt is further reduced and the resin is fully cured.

Abstract: The invention relates to an optical element comprising a substrate which is provided with a transparent layer comprising an organic polymer network and one or more photochromic compounds, in which the transmission of the optical element in the visible wavelength range changes in response to a variation of incident light, while the transparent layer comprising photochromic compounds is provided with a protective coating on the side remote from the substrate side.

Abstract: A display device (1) is provided with a means (15) for selectively transmitting and blocking light from specific areas of the image. The means for blocking comprises an LCD cells or a number of LCD cells, which cells comprises an oriented polymer network, an LC material with negative &Dgr;&egr; and a pleochroic dye.

Abstract: An assembly is provided suitable for use in visual display devices, such as Cathode Ray Tubes (CRTs) and Plasma Display Panels (PDPs) comprising a set of polarizers comprising reflective polarizer means and absorbing polarizer means, and optionally a quarter wave retardation means, which enhances the luminance-contrast performance of said visual display devices, wherein said reflective polarizer means is comprised of birefringent inorganic thin-film material, e.g. silica. This inorganic polarizer material is preferably arranged at the inner side of the display and resists the manufacturing and operating conditions in a display device. Light emitted by the phosphor dots becomes polarized with an efficiency between 50 and 100%. This polarized light is fully transmitted by the dichroic polarizer whereas incident daylight is absorbed for more than 50%. Also claimed are visual display devices comprising said assembly, and methods of manufacturing said assembly and said visual display devices.

Abstract: A display device (1) is provided with a means (15) for selectively transmitting and blocking light from specific areas of the image. The means for blocking comprises an LCD cells or a number of LCD cells, which cells comprises an oriented polymer network, an LC material with negative &Dgr;&egr; and a pleochroic dye.

Abstract: 1. A display device is manufactured having a display with an auxiliary plate. The display window (3) and the auxiliary plate (15) are oriented at an angle of tilt &agr;1, preferably substantially vertically, the volume in between the display window and auxiliary plate is filed up to a selected level height (h) with uncured resin, a seal (17) and an opening (18) being provided at or near the highest point. Thereafter the display window is reoriented to a more horizontal position (smaller angle of tilt &agr;2) the auxiliary plate being positioned on top of the display window inducing a flow v of curable material (16) towards the opening (18), and when the resin has reached the opening the resin near the opening is plugged, where after the angle of tilt is further reduced and the resin is fully cured. FIG.