Patents by Inventor Gota Niimi

Gota Niimi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210364928
    Abstract: A tin trap device for collecting tin in a chamber device which causes tin to be turned into plasma with laser light in an internal space thereof may include a housing provided with a gas inlet port through which exhaust gas in the chamber device flows and a gas exhaust port through which the exhaust gas is exhausted; and a main heater arranged in the housing, configured to have a temperature equal to or higher than the melting point of tin and lower than the boiling point thereof, and having a projection surface projected toward a direction in which the exhaust gas flows in the gas inlet port cover the gas inlet port.
    Type: Application
    Filed: August 10, 2021
    Publication date: November 25, 2021
    Applicant: Gigaphoton Inc.
    Inventors: Gota NIIMI, Yoshifumi UENO, Shinji NAGAI
  • Patent number: 11145429
    Abstract: An extreme ultraviolet chamber apparatus includes: a chamber; an EUV condensing mirror arranged in the chamber; a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror; a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror; and an exhaust port arranged in the chamber.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: October 12, 2021
    Assignee: Gigaphoton Inc.
    Inventors: Atsushi Ueda, Gota Niimi, Georg Soumagne
  • Publication number: 20200312479
    Abstract: An extreme ultraviolet chamber apparatus includes: a chamber; an EUV condensing mirror arranged in the chamber; a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror; a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror; and an exhaust port arranged in the chamber.
    Type: Application
    Filed: March 17, 2020
    Publication date: October 1, 2020
    Applicant: Gigaphoton Inc.
    Inventors: Atsushi UEDA, Gota NIIMI, Georg SOUMAGNE
  • Patent number: 10591342
    Abstract: Disclosed herein a liquid level detection device capable of appropriately detecting a liquid level of a high temperature plasma raw material in a reservoir for storing the high temperature plasma raw material. The liquid level detection device includes: an upper limit level sensor configured to detect that the liquid level of the tin is elevated from downward to reach an upper limit level; and a refilling level sensor configured to detect that the liquid level of the tin is lowered from upward to reach a refilling level or a lower limit level. A detection responsiveness of the liquid level of the upper limit level sensor is higher than the refilling level sensor or the lower limit level sensor, and a detectability of the liquid level of the refilling level sensor or the lower limit level sensor is higher than the upper limit level sensor.
    Type: Grant
    Filed: November 19, 2015
    Date of Patent: March 17, 2020
    Assignee: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Akihisa Nagano, Gota Niimi
  • Publication number: 20170350745
    Abstract: Disclosed herein a liquid level detection device capable of appropriately detecting a liquid level of a high temperature plasma raw material in a reservoir for storing the high temperature plasma raw material. The liquid level detection device includes: an upper limit level sensor configured to detect that the liquid level of the tin is elevated from downward to reach an upper limit level; and a refilling level sensor configured to detect that the liquid level of the tin is lowered from upward to reach a refilling level or a lower limit level. A detection responsiveness of the liquid level of the upper limit level sensor is higher than the refilling level sensor or the lower limit level sensor, and a detectability of the liquid level of the refilling level sensor or the lower limit level sensor is higher than the upper limit level sensor.
    Type: Application
    Filed: November 19, 2015
    Publication date: December 7, 2017
    Applicant: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Akihisa NAGANO, Gota NIIMI
  • Patent number: 9686846
    Abstract: An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.
    Type: Grant
    Filed: August 3, 2016
    Date of Patent: June 20, 2017
    Assignee: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Yusuke Teramoto, Gota Niimi, Takahiro Hiraoka, Pieter Goldhoorn
  • Patent number: 9581392
    Abstract: An arrangement for cooling a plasma-based radiation source with a metal cooling liquid and a method for starting up a cooling arrangement of this type has a pump unit for conveying the metal cooling liquid from a reservoir to an immersion bath in a pipe portion that is connected to the reservoir in the conveying direction of the cooling circuit has at least one pump for conveying the metal cooling liquid through an external field effect of the at least one pump. A control unit for controlling the at least one pump controls the at least one pump at least temporarily in a pumping direction opposite to the conveying direction of the cooling circuit in order to generate a heating effect through external field effect on metal cooling liquid located in the pipe portion.
    Type: Grant
    Filed: February 27, 2015
    Date of Patent: February 28, 2017
    Assignee: USHIO Denki Kabushiki Kaisha
    Inventors: Gota Niimi, Dominik Marcel Vaudrevange, Ralf Gordon Conrads, Maghiel Jan Kole
  • Patent number: 9572240
    Abstract: Disclosed herein a light source apparatus that is capable of suppressing a light transmission rate of a debris trap to be lowered and a reflection rate in a light condenser mirror to be lowered. In the light source apparatus, a shielding member is provided having an aperture is provided in front of a stationary type foil trap to limit a solid angle of light emitted from a high temperature plasma. Furthermore, the stationary type foil trap is provided with a driving mechanism to allow the foil trap to be revolved such that an adhesion part of the debris of the foil trap is deviated from a position of the foil trap facing the aperture.
    Type: Grant
    Filed: December 12, 2014
    Date of Patent: February 14, 2017
    Assignee: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Gota Niimi, Hironobu Yabuta
  • Publication number: 20160345419
    Abstract: An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.
    Type: Application
    Filed: August 3, 2016
    Publication date: November 24, 2016
    Applicant: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Yusuke TERAMOTO, Gota NIIMI, Takahiro HIRAOKA, Pieter GOLDHOORN
  • Publication number: 20160330826
    Abstract: Disclosed herein a light source apparatus that is capable of suppressing a light transmission rate of a debris trap to be lowered and a reflection rate in a light condenser mirror to be lowered. In the light source apparatus, a shielding member is provided having an aperture is provided in front of a stationary type foil trap to limit a solid angle of light emitted from a high temperature plasma. Furthermore, the stationary type foil trap is provided with a driving mechanism to allow the foil trap to be revolved such that an adhesion part of the debris of the foil trap is deviated from a position of the foil trap facing the aperture.
    Type: Application
    Filed: December 12, 2014
    Publication date: November 10, 2016
    Applicant: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Gota NIIMI, Hironobu YABUTA
  • Patent number: 9480136
    Abstract: An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.
    Type: Grant
    Filed: April 24, 2014
    Date of Patent: October 25, 2016
    Assignee: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Yusuke Teramoto, Gota Niimi, Takahiro Hiraoka, Pieter Goldhoorn
  • Publication number: 20160073486
    Abstract: An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.
    Type: Application
    Filed: April 24, 2014
    Publication date: March 10, 2016
    Applicant: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Yusuke TERAMOTO, Gota NIIMI, Takahiro HIRAOKA, Pieter GOLDHOORN
  • Patent number: 9202659
    Abstract: An arrangements and methods for cooling a plasma-based radiation source having a revolving element which is to be cooled, particularly for application in EUV radiation sources, is disclosed. The revolving element is immersed in the metal coolant in a first vessel of a primary cooling circuit, and a secondary cooling circuit with a cooling liquid evaporating at the desired operating temperature of the metal coolant has a control unit for controlling at least one atomizing arrangement in a differentiated manner and for selectively controlling a heater in case the determined temperature falls below a minimum operating temperature of the metal coolant. The at least one atomizing arrangement in a cooling section selectively sprays individual wall regions of the first vessel with the cooling liquid depending on the determined temperature of the metal coolant.
    Type: Grant
    Filed: October 20, 2014
    Date of Patent: December 1, 2015
    Assignee: USHIO Denki Kabushiki Kaisha
    Inventors: Gota Niimi, Dominik Marcel Vaudrevange, Ralf Gordon Conrads, Maghiel Jan Kole, Wilhelmus V. J. Van Nunspeet, Johannes W. J. L. Cuijpers, Andre Matthias Prinz
  • Publication number: 20150247679
    Abstract: An arrangement for cooling a plasma-based radiation source with a metal cooling liquid and a method for starting up a cooling arrangement of this type has a pump unit for conveying the metal cooling liquid from a reservoir to an immersion bath in a pipe portion that is connected to the reservoir in the conveying direction of the cooling circuit has at least one pump for conveying the metal cooling liquid through an external field effect of the at least one pump. A control unit for controlling the at least one pump controls the at least one pump at least temporarily in a pumping direction opposite to the conveying direction of the cooling circuit in order to generate a heating effect through external field effect on metal cooling liquid located in the pipe portion.
    Type: Application
    Filed: February 27, 2015
    Publication date: September 3, 2015
    Inventors: Gota NIIMI, Dominik Marcel VAUDREVANGE, Ralf Gordon CONRADS, Maghiel Jan KOLE
  • Publication number: 20150108365
    Abstract: An arrangements and methods for cooling a plasma-based radiation source having a revolving element which is to be cooled, particularly for application in EUV radiation sources, is disclosed. The revolving element is immersed in the metal coolant in a first vessel of a primary cooling circuit, and a secondary cooling circuit with a cooling liquid evaporating at the desired operating temperature of the metal coolant has a control unit for controlling at least one atomizing arrangement in a differentiated manner and for selectively controlling a heater in case the determined temperature falls below a minimum operating temperature of the metal coolant. The at least one atomizing arrangement in a cooling section selectively sprays individual wall regions of the first vessel with the cooling liquid depending on the determined temperature of the metal coolant.
    Type: Application
    Filed: October 20, 2014
    Publication date: April 23, 2015
    Inventors: Gota NIIMI, Dominik Marcel VAUDREVANGE, Ralf Gordon CONRADS, Maghiel Jan KOLE, Wilhelmus V. J. VAN NUNSPEET, Johannes W. J. L. CUIJPERS, Andre Matthias PRINZ
  • Publication number: 20140307857
    Abstract: An arrangement for handling a liquid metal for cooling revolving components of a radiation source based on a radiation-emitting plasma has the handling arrangement for the liquid metal comprises a reservoir of liquid metal in a vessel, a tempering device for adjusting the temperature moderately above the melting point of the metal, a pump unit for moving the liquid metal in circulation. The handling unit containing the reservoir and the pump unit is provided for transporting the metal into a separated source module via a feed pipe and a return pipe for guiding highly heated metal back from the source module into the reservoir. The return pipe is formed as a straight pipe slightly inclined to the reservoir to guide the heated metal back by action of gravity in a substantially laminar flow.
    Type: Application
    Filed: April 11, 2014
    Publication date: October 16, 2014
    Applicant: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Gota Niimi, Paulus P. M. Blom, Wilhelmus V. J. Van Nunspeet
  • Patent number: 7482740
    Abstract: An electrode unit of an extreme ultraviolet radiation generator comprise a breakdown voltage impression electrode, a ground electrode, an insulator provided in contact with the breakdown voltage impression electrode and the ground electrode in which plasma is generated between the discharge electrodes thereby emitting extreme ultraviolet radiation from the generated plasma, wherein at least one of the breakdown voltage impression electrode and the ground electrode includes a cooling portion which is made of copper, aluminum, or a material which contains copper, aluminum, or combination thereof as a main component and in which a passage through which a coolant passes is formed, and a discharge portion which is provided in close contact with a surface of the cooling portion, and which is made of any one of tungsten, tantalum, rhenium, molybdenum, and an alloy thereof as the a main component.
    Type: Grant
    Filed: May 19, 2006
    Date of Patent: January 27, 2009
    Assignee: Ushio Denki Kabushiki Kaisha
    Inventor: Gota Niimi
  • Publication number: 20060261721
    Abstract: An electrode unit of an extreme ultraviolet radiation generator comprise a breakdown voltage impression electrode, a ground electrode, an insulator provided in contact with the breakdown voltage impression electrode and the ground electrode in which plasma is generated between the discharge electrodes thereby emitting extreme ultraviolet radiation from the generated plasma, wherein at least one of the breakdown voltage impression electrode and the ground electrode includes a cooling portion which is made of copper, aluminum, or a material which contains copper, aluminum, or combination thereof as a main component and in which a passage through which a coolant passes is formed, and a discharge portion which is provided in close contact with a surface of the cooling portion, and which is made of any one of tungsten, tantalum, rhenium, molybdenum, and an alloy thereof as the a main component.
    Type: Application
    Filed: May 19, 2006
    Publication date: November 23, 2006
    Applicant: USHIO DENKI KABUSHIKI KAISHA
    Inventor: Gota Niimi