Patents by Inventor Gottfried Hochleitner

Gottfried Hochleitner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Adapting the duration of exposure slots in multi-beam writers
    Patent number: 11099482
    Abstract: In a charged-particle lithography apparatus, during writing a desired pattern, the duration of exposure slots is adapted to compensate for fluctuations of the particle beam. In the writing process the aperture images are mutually overlapping on the target so each pixel is exposed through a number of aperture images overlapping at the respective pixel, which results in an exposure of the respective pixel through an effective pixel exposure time, i.e.
    Type: Grant
    Filed: May 1, 2020
    Date of Patent: August 24, 2021
    Assignee: IMS Nanofabrication GmbH
    Inventors: Gottfried Hochleitner, Christoph Spengler, Wolf Naetar
  • Adapting the Duration of Exposure Slots in Multi-Beam Writers
    Publication number: 20200348597
    Abstract: In a charged-particle lithography apparatus, during writing a desired pattern, the duration of exposure slots is adapted to compensate for fluctuations of the particle beam. In the writing process the aperture images are mutually overlapping on the target so each pixel is exposed through a number of aperture images overlapping at the respective pixel, which results in an exposure of the respective pixel through an effective pixel exposure time, i.e.
    Type: Application
    Filed: May 1, 2020
    Publication date: November 5, 2020
    Applicant: IMS Nanofabrication GmbH
    Inventors: Gottfried Hochleitner, Christoph Spengler, Wolf Naetar
  • Method of depositing protective structures
    Patent number: 9006681
    Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.
    Type: Grant
    Filed: March 10, 2014
    Date of Patent: April 14, 2015
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
  • Method of Depositing Protective Structures
    Publication number: 20140191126
    Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.
    Type: Application
    Filed: March 10, 2014
    Publication date: July 10, 2014
    Applicant: Carl Zeiss Microscopy GmbH
    Inventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
  • Method of Depositing Protective Structures
    Publication number: 20120187291
    Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.
    Type: Application
    Filed: March 23, 2012
    Publication date: July 26, 2012
    Applicant: CARL ZEISS NTS GMBH
    Inventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
  • Method of depositing protective structures
    Patent number: 8143594
    Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.
    Type: Grant
    Filed: February 5, 2010
    Date of Patent: March 27, 2012
    Inventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
  • System and method for processing an object
    Patent number: 7923702
    Abstract: A system and a method for processing and inspecting an object are provided, wherein the system comprises a particle beam column, an object holder and a gas supply apparatus. Thereby, the object holder is formed comprising a base, a first table displaceable relative to the base, a second table displaceable relative to the first table and a third table rotatable relative to the second table, wherein the cannula of the gas supply apparatus is fixed at the first table.
    Type: Grant
    Filed: November 11, 2008
    Date of Patent: April 12, 2011
    Assignee: Carl Zeiss NTS GmbH
    Inventors: Wolfram Buhler, Alexander Rosenthal, Emmerich Bertagnolli, Heinz Wanzenbock, Markus Fischer, Gottfried Hochleitner
  • Method of depositing protective structures
    Publication number: 20100276607
    Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.
    Type: Application
    Filed: February 5, 2010
    Publication date: November 4, 2010
    Inventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
  • System and Method for Processing an Object
    Publication number: 20090152459
    Abstract: A system and a method for processing and inspecting an object are provided, wherein the system comprises a particle beam column, an object holder and a gas supply apparatus. Thereby, the object holder is formed comprising a base, a first table displaceable relative to the base, a second table displaceable relative to the first table and a third table rotatable relative to the second table, wherein the cannula of the gas supply apparatus is fixed at the first table.
    Type: Application
    Filed: November 11, 2008
    Publication date: June 18, 2009
    Applicant: Carl Zeiss NTS GmbH
    Inventors: Wolfram Buhler, Alexander Rosenthal, Emmerich Bertagnolli, Heinz Wanzenbock, Markus Fischer, Gottfried Hochleitner