Abstract: A method of patterning a monolayer including the steps of providing a monolayer of a compound on a substrate, positioning a near field light source in relation to the monolayer so that light from the light source irradiates the monolayer in the near field regime, the wavelength of the light being suitable to react with molecules in the monolayer and initiate a photochemical reaction, and patterning the monolayer by causing a relative movement of the monolayer and the near field light source, the relative movement corresponding to a desired pattern.