Patents by Inventor Graham Wright

Graham Wright has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250079113
    Abstract: An ion source with a sputter target located at the end of the ion source is disclosed. The ion source may include an indirectly heated cathode and the sputter target may be disposed on the end opposite the cathode. The ion source may contain one or more side electrodes, wherein at least one of these electrodes is electrically biased relative to the arc chamber. In one embodiment, the second end of the ion source is made of a dopant containing material and serves as the sputter target. In another embodiment, there is an opening in the second end, and an insert is disposed in this opening. The insert is made of a dopant containing material and serves as the sputter target.
    Type: Application
    Filed: August 28, 2023
    Publication date: March 6, 2025
    Inventor: Graham Wright
  • Patent number: 12224149
    Abstract: An ion source for generating an ion beam containing aluminum ions is disclosed. The ion source includes a first gas source to introduce an organoaluminium compound into the arc chamber of the ion source. A second gas, different from the first gas, which is a chlorine-containing gas is also introduced to the arc chamber. The chloride co-flow reduces the buildup of decomposition material that occurs within the arc chamber. This buildup may occur at the gas bushing, the extraction aperture or near the repeller. In some embodiments, the second gas is introduced continuously. In other embodiments, the second gas is periodically introduced, based on hours of operation or the measured uniformity of the extracted ion beam. The second gas may be introduced from second gas source or from a vaporizer.
    Type: Grant
    Filed: January 20, 2023
    Date of Patent: February 11, 2025
    Assignee: Applied Materials, Inc.
    Inventors: Mateo Navarro Goldaraz, Graham Wright, Ori Noked
  • Patent number: 12154754
    Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible contains a solid dopant material, such as a metal. A porous wicking tip is disposed in the crucible in contact with the solid dopant material. The porous wicking tip may be a tube with one or more interior conduits. Alternatively, the porous tip may be two concentric cylinders with a plurality of rods disposed in the annular ring between the two cylinders. Alternatively, the porous tip may be one or more foil layers wound together. In each of these embodiments, the wicking tip can be used to control the flow rate of molten dopant material to the arc chamber.
    Type: Grant
    Filed: June 8, 2022
    Date of Patent: November 26, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Craig R. Chaney, Graham Wright
  • Patent number: 12154753
    Abstract: An ion source capable of extracting a ribbon ion beam with improved uniformity is disclosed. One of the walls of the ion source has a protrusion on its interior surface facing the chamber. The protrusion creates a loss area that serves as a sink for free electrons and ions. This causes a reduction in plasma density near the protrusion, and may improve the uniformity of the ribbon ion beam that is extracted from the ion source by modifying the beam current near the protrusion. The shape of the protrusion may be modified to achieve the desired uniformity. The protrusion may also be utilized with a cylindrical ion source. In certain embodiments, the protrusion is created by a plurality of mechanically adjustable protrusion elements.
    Type: Grant
    Filed: September 13, 2021
    Date of Patent: November 26, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Jay T. Scheuer, Graham Wright, Peter F. Kurunczi, Alexandre Likhanskii
  • Patent number: 12154766
    Abstract: An ion source that is capable of different modes of operation is disclosed. A vaporizer is in communication with the ion source. The ion source may have several gas inlets, in communication with different gasses. When operating in a first mode, the ion source may supply a first gas, such as an inert gas, while heating the vaporizer. When operating in a second mode, the ion source may supply a second gas, which may be an organoaluminium gas. When operating in a third mode, the ion source may supply the second gas, while heating the vaporizer. Ions having single charges may be created in the first and second modes, while ions having multiple charges may be created in the third mode.
    Type: Grant
    Filed: June 7, 2022
    Date of Patent: November 26, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Graham Wright, Shardul S. Patel
  • Publication number: 20240331972
    Abstract: An actively cooled gas conduit for use with an ion source is disclosed. The gas conduit includes a gas channel and a cooling channel that may be adjacent to one another for at least a portion of the length of the gas channel. The gas conduit may be constructed by bonding two or more tubes together. Alternatively, the gas conduit may be constructed using additive manufacturing such that the cooling channel and the gas channel are within the same gas conduit. In some embodiments, the return channel is also disposed in the gas conduit. By actively cooling the gas conduit, the temperature of the gas conduit may be lowered, which reducing the possibility of clogging due to decomposition of the feed gas.
    Type: Application
    Filed: March 29, 2023
    Publication date: October 3, 2024
    Inventors: Adam M. McLaughlin, Graham Wright, Mateo Navarro Goldaraz
  • Patent number: 12094681
    Abstract: An ion source that is capable of different modes of operation is disclosed. The ion source includes an insertable target holder includes a hollow interior into which the solid dopant material is disposed. The target holder may a porous surface at a first end, through which vapors from the solid dopant material may enter the arc chamber. The porous surface inhibits the passage of liquid or molten dopant material into the arc chamber. The target holder is also constructed such that it may be refilled with dopant material when the dopant material within the hollow interior has been consumed. A solid target is also disposed in the arc chamber. When the insertable target holder is used, multicharged ions are created. When the insertable target holder is retracted, single charged ions are created by only etching the solid dopant-containing compound.
    Type: Grant
    Filed: May 10, 2022
    Date of Patent: September 17, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Graham Wright, Shardul S. Patel
  • Publication number: 20240249904
    Abstract: An ion source for generating an ion beam containing aluminum ions is disclosed. The ion source includes a first gas source to introduce an organoaluminium compound into the arc chamber of the ion source. A second gas, different from the first gas, which is a chlorine-containing gas is also introduced to the arc chamber. The chloride co-flow reduces the buildup of decomposition material that occurs within the arc chamber. This buildup may occur at the gas bushing, the extraction aperture or near the repeller. In some embodiments, the second gas is introduced continuously. In other embodiments, the second gas is periodically introduced, based on hours of operation or the measured uniformity of the extracted ion beam. The second gas may be introduced from second gas source or from a vaporizer.
    Type: Application
    Filed: January 20, 2023
    Publication date: July 25, 2024
    Inventors: Mateo Navarro Goldaraz, Graham Wright, Ori Noked
  • Patent number: 12040154
    Abstract: An ion source that is capable of different modes of operation is disclosed. A solid target may be disposed in the arc chamber. The ion source may have several gas inlets, in communication with different gasses. When operating in a first mode, the ion source may supply a first gas, such as a halogen containing gas. When operating in a second mode, the ion source may supply an organoaluminium gas. Ions having single charges may be created in the first mode, while ions having multiple charges may be created in the second mode. In some embodiments, the solid target may be retractable.
    Type: Grant
    Filed: May 10, 2022
    Date of Patent: July 16, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Graham Wright, Shardul S. Patel
  • Patent number: 11996281
    Abstract: An ion source that may be used to introduce a dopant material into the arc chamber is disclosed. A component containing the dopant material is disposed in the path of an etching gas, which also enters the arc chamber. In some embodiments, the dopant material is in liquid form, and the etching gas travels through the liquid. In other embodiments, the dopant material is a solid material. In some embodiments, the solid material is formed as a porous structure, such that the etching gas flows through the solid material. In other embodiments, one or more components of the ion source are manufactured using a material that includes the dopant material, such that the etching gas etches the component to release the dopant material.
    Type: Grant
    Filed: June 7, 2023
    Date of Patent: May 28, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Graham Wright, Ori Noked, Craig R. Chaney, Adam M. McLaughlin
  • Patent number: 11887806
    Abstract: An ion source is provided. The ion source may include an ion chamber to generate an ion beam comprising a metal ion species; and a charge source, coupled to deliver a metal vapor to the ion chamber, the charge source including a charge mixture. The charge mixture may include a first portion, comprising an elemental metal; and a second portion, comprising a heterogeneous metal fluoride compound.
    Type: Grant
    Filed: April 7, 2022
    Date of Patent: January 30, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Graham Wright, Ryan C. Prager
  • Patent number: 11854760
    Abstract: A crucible that exploits the observation that molten metal tends to flow toward the hottest regions is disclosed. The crucible includes an interior in which dopant material may be disposed. The crucible has a pathway leading from the interior toward an aperture, wherein the temperature is continuously increasing along the pathway. The aperture may be disposed in or near the interior of the arc chamber of an ion source. The liquid metal flows along the pathway toward the arc chamber, where it is vaporized and then ionized. By controlling the flow rate of the pathway, spillage may be reduced. In another embodiment, an inverted crucible is disclosed. The inverted crucible comprises a closed end in communication with the interior of the ion source, so that the closed end is the hottest region of the crucible. An opening is disposed on a different wall to allow vapor to exit the crucible.
    Type: Grant
    Filed: June 21, 2021
    Date of Patent: December 26, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Graham Wright, Eric Donald Wilson, Daniel Alvarado, Robert C. Lindberg, Jacob Mullin
  • Publication number: 20230402247
    Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible contains a solid dopant material, such as a metal. A porous wicking tip is disposed in the crucible in contact with the solid dopant material. The porous wicking tip may be a tube with one or more interior conduits. Alternatively, the porous tip may be two concentric cylinders with a plurality of rods disposed in the annular ring between the two cylinders. Alternatively, the porous tip may be one or more foil layers wound together. In each of these embodiments, the wicking tip can be used to control the flow rate of molten dopant material to the arc chamber.
    Type: Application
    Filed: June 8, 2022
    Publication date: December 14, 2023
    Inventors: Craig R. Chaney, Graham Wright
  • Publication number: 20230395357
    Abstract: An ion source that is capable of different modes of operation is disclosed. A vaporizer is in communication with the ion source. The ion source may have several gas inlets, in communication with different gasses. When operating in a first mode, the ion source may supply a first gas, such as an inert gas, while heating the vaporizer. When operating in a second mode, the ion source may supply a second gas, which may be an organoaluminium gas. When operating in a third mode, the ion source may supply the second gas, while heating the vaporizer. Ions having single charges may be created in the first and second modes, while ions having multiple charges may be created in the third mode.
    Type: Application
    Filed: June 7, 2022
    Publication date: December 7, 2023
    Inventors: Graham Wright, Shardul S. Patel
  • Publication number: 20230369007
    Abstract: An ion source that is capable of different modes of operation is disclosed. A solid target may be disposed in the arc chamber. The ion source may have several gas inlets, in communication with different gasses. When operating in a first mode, the ion source may supply a first gas, such as a halogen containing gas. When operating in a second mode, the ion source may supply an organoaluminium gas. Ions having single charges may be created in the first mode, while ions having multiple charges may be created in the second mode. In some embodiments, the solid target may be retractable.
    Type: Application
    Filed: May 10, 2022
    Publication date: November 16, 2023
    Inventors: Graham Wright, Shardul S. Patel
  • Publication number: 20230369006
    Abstract: An ion source that is capable of different modes of operation is disclosed. The ion source includes an insertable target holder includes a hollow interior into which the solid dopant material is disposed. The target holder may a porous surface at a first end, through which vapors from the solid dopant material may enter the arc chamber. The porous surface inhibits the passage of liquid or molten dopant material into the arc chamber. The target holder is also constructed such that it may be refilled with dopant material when the dopant material within the hollow interior has been consumed. The ion source may have several gas inlets. When the insertable target holder is used, the ion source may supply a first gas, such as a halogen containing gas. When operating in a second mode, the ion source may utilize an organoaluminium gas.
    Type: Application
    Filed: May 10, 2022
    Publication date: November 16, 2023
    Inventors: Graham Wright, Shardul S. Patel
  • Publication number: 20230369008
    Abstract: An ion source that is capable of different modes of operation is disclosed. The ion source includes an insertable target holder includes a hollow interior into which the solid dopant material is disposed. The target holder may a porous surface at a first end, through which vapors from the solid dopant material may enter the arc chamber. The porous surface inhibits the passage of liquid or molten dopant material into the arc chamber. The target holder is also constructed such that it may be refilled with dopant material when the dopant material within the hollow interior has been consumed. A solid target is also disposed in the arc chamber. When the insertable target holder is used, multicharged ions are created. When the insertable target holder is retracted, single charged ions are created by only etching the solid dopant-containing compound.
    Type: Application
    Filed: May 10, 2022
    Publication date: November 16, 2023
    Inventors: Graham Wright, Shardul S. Patel
  • Patent number: 11810746
    Abstract: An ion source having an extraction plate with a variable thickness is disclosed. The extraction plate has a protrusion on its interior or exterior surface proximate the extraction aperture. The protrusion increases the thickness of the extraction aperture in certain regions. This increases the loss area in those regions, which serves as a sink for ions and electrons. In this way, the plasma density is decreased more significantly in the regions where the extraction aperture has a greater thickness. The shape of the protrusion may be modified to achieve the desired plasma uniformity. Thus, it may be possible to create an extracted ion beam having a more uniform ion density. In some tests, the uniformity of the beam current along the width direction was improved by between 20% and 50%.
    Type: Grant
    Filed: September 13, 2021
    Date of Patent: November 7, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Alexandre Likhanskii, Alexander S. Perel, Jay T. Scheuer, Bon-Woong Koo, Robert C. Lindberg, Peter F. Kurunczi, Graham Wright
  • Publication number: 20230326703
    Abstract: An ion source is provided. The ion source may include an ion chamber to generate an ion beam comprising a metal ion species; and a charge source, coupled to deliver a metal vapor to the ion chamber, the charge source including a charge mixture. The charge mixture may include a first portion, comprising an elemental metal; and a second portion, comprising a heterogeneous metal fluoride compound.
    Type: Application
    Filed: April 7, 2022
    Publication date: October 12, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Graham Wright, Ryan C. Prager
  • Patent number: D1051838
    Type: Grant
    Filed: December 10, 2021
    Date of Patent: November 19, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Bon-Woong Koo, Frank Sinclair, Alexandre Likhanskii, Svetlana Radovanov, Alexander Perel, Graham Wright, Jay T. Scheuer, Daniel Tieger, You Chia Li, Jay Johnson, Tseh-Jen Hsieh, Ronald Johnson