Patents by Inventor Granger Lobb

Granger Lobb has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multiple patterning process for forming pillar mask elements
    Patent number: 10026645
    Abstract: A method includes forming a stack of hard mask layers above a process layer. The stack includes first, second and third hard mask layers. The third hard mask layer is patterned to define therein a first mask element and to expose portions of the second hard mask layer. The second hard mask layer is patterned to define therein a second mask element below the first mask element and a third mask element, and to expose portions of the first hard mask layer. The first hard mask layer is patterned to define therein a fourth mask element below the second mask element, a fifth mask element below the third mask element, and a sixth mask element, and to expose portions of the process layer. The process layer is etched to remove portions of the process layer not covered by the first hard mask layer.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: July 17, 2018
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Shyam Pal, Granger Lobb, Aleksandra Clancy
  • MULTIPLE PATTERNING PROCESS FOR FORMING PILLAR MASK ELEMENTS
    Publication number: 20180061699
    Abstract: A method includes forming a stack of hard mask layers above a process layer. The stack includes first, second and third hard mask layers. The third hard mask layer is patterned to define therein a first mask element and to expose portions of the second hard mask layer. The second hard mask layer is patterned to define therein a second mask element below the first mask element and a third mask element, and to expose portions of the first hard mask layer. The first hard mask layer is patterned to define therein a fourth mask element below the second mask element, a fifth mask element below the third mask element, and a sixth mask element, and to expose portions of the process layer. The process layer is etched to remove portions of the process layer not covered by the first hard mask layer.
    Type: Application
    Filed: August 31, 2016
    Publication date: March 1, 2018
    Inventors: Shyam Pal, Granger Lobb, Aleksandra Clancy