Patents by Inventor Grant D. Imper

Grant D. Imper has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Bi-directional processing chamber and method for bi-directional processing of semiconductor substrates
    Patent number: 6399510
    Abstract: A semiconductor substrate processing chamber provides a bi-directional process gas flow for deposition or etching processes. The bi-directional gas flow provides uniformity of deposition layer thickness or uniformity of etching without the need to rotate the substrate. Junctions are provided at opposite ends of a processing chamber. Inlet and outlet ports are provided on each junction. Inlet and outlet ports on opposite junctions cooperate to provide a gas flow in a first direction for half of the process cycle, and in a second direction for the other half of the process cycle.
    Type: Grant
    Filed: September 12, 2000
    Date of Patent: June 4, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Norma B. Riley, Roger N. Anderson, Grant D. Imper, Paul Comita