Abstract: A snow blower including an auger housing, an auger rotatably positioned within the auger housing and configured to blow snow, a shaft attached to the auger and the auger housing, a chute attached to the auger housing and configured to direct the snow blown by the auger away from the snow blower, and at least one sensor configured to detect at least one of a rotational speed of the auger or the shaft and a load, torque, and/or thrust on the shaft or the auger housing. The data collected by the at least one sensor is used to determine an instantaneous flow rate of snow.

Abstract: A support structure is applied directly to the first side of a semiconductor work piece or wafer by a stereolithographic process layer by layer completely about and extending inwardly of the periphery of the wafer, but external to the selected area within which a desired circuitry pattern is placed, the support structure being of a desired height and of a material resistive to an acid etch process effective to seal the circuitry pattern in the selected area from acid when the work piece is subjected to an acid etch on the opposing second side and about the periphery. The support structure further strengthens the work piece against flexural failure.