Abstract: An integrated circuit includes a decoupling capacitor configured to be enabled in response to the decoupling capacitor not increasing a standby current of the integrated circuit and disabled in response to the decoupling capacitor increasing the standby current of the integrated circuit.

Abstract: A semiconductor integrated circuit memory device, and test method for a memory device are provided in which an external wordline voltage is applied to a wordline of the memory device. A current on the wordline is measured as a result of application of the externally supplied wordline voltage. The measured current is compared to a reference value to determine whether the wordline has a defect, in particular a short-circuit defect. A tester device is connected to the memory device and supplies the external wordline voltage. The current measurement and comparison may be made internally by circuitry on the memory device or externally by circuitry in a tester device.

Abstract: A semiconductor integrated circuit memory device, and test method for a memory device are provided in which an external wordline voltage is applied to a wordline of the memory device. A current on the wordline is measured as a result of application of the externally supplied wordline voltage. The measured current is compared to a reference value to determine whether the wordline has a defect, in particular a short-circuit defect. A tester device is connected to the memory device and supplies the external wordline voltage. The current measurement and comparison may be made internally by circuitry on the memory device or externally by circuitry in a tester device.

Abstract: As disclosed herein, an electrostatic discharge (ESD) protection circuit is provided for an integrated circuit including a semiconductor substrate. The ESD protection circuit includes a plurality of active devices formed in the semiconductor substrate, the active devices being formed by a process including a plurality of steps carried out to form, at the same time, a plurality of active devices having a function other than ESD protection. For example, the ESD circuit may include an array of vertical transistors formed according to a process including many of the steps used to form, at the same time, vertical transistors of a DRAM array. Also disclosed is the formation of an ESD circuit in an “unusable” area of a semiconductor chip, such as under a bond pad, land or under bump metallization of the chip.

Abstract: As disclosed herein, an electrostatic discharge (ESD) protection circuit is provided for an integrated circuit including a semiconductor substrate. The ESD protection circuit includes a plurality of active devices formed in the semiconductor substrate, the active devices being formed by a process including a plurality of steps carried out to form, at the same time, a plurality of active devices having a function other than ESD protection. For example, the ESD circuit may include an array of vertical transistors formed according to a process including many of the steps used to form, at the same time, vertical transistors of a DRAM array. Also disclosed is the formation of an ESD circuit in an “unusable” area of a semiconductor chip, such as under a bond pad, land or under bump metallization of the chip.