Abstract: A panel platen for holding substrates such as PCBs has an automatic shimming mechanism to provide shims for panels of varying sizes and/or thicknesses. A platen includes a top surface, and a plurality of adjustable shims located below the top surface and around an edge of the platen, wherein the adjustable shims can be raised and lowered to a desired height to compensate for different sizes or thicknesses of substrates. A platen may include a top surface, a plurality of adjustable height pads located around an edge of the top surface, and a motorized control mechanism located below the top surface and configured to raise and lower the plurality of adjustable height pads. A method of automatically shimming different sized substrates on a platen includes providing a plurality of motorized shims under a top surface of the platen, and raising and lowering the motorized shims based on a size or thickness of a substrate.

Abstract: An automatic substrate transport system having adjustable mechanisms to guide and float substrates on a film of air along a sloped path, permits smooth movement with significantly reduced contact and abrasion damage to imaged surfaces on the substrates. This allows for the transportation of any substrates including those coated with somewhat tacky coatings, thus reducing machine downtime associated with clearing line blockages, as well as transport mechanism cleaning.

Abstract: A substrate holding platen has a top surface having a plurality of openings, an enclosed plenum area below the top surface, and a large orifice valve connecting the plenum area to a high flow vacuum pump. The plurality of openings may include snubber slots on the top surface, and/or openings for automatic shims. The high flow vacuum pump preferably pulls between 100-150 cubic feet per minute (cfm) of air from the plenum through the large orifice valve.

Abstract: A lamp exposure system producing uniform, high intensity ultraviolet light includes a plurality of lamps generating light in an ultraviolet spectrum range, a separate reflector associated with and covering each of the plurality of lamps, forming distinct lamp and reflector pairs, such that each lamp reflector pair has a generally separate reflective light path to a surface of a substrate, at least one capacitor connected to each lamp to store energy to energize the lamp, and a triggering and control circuit to trigger the at least one capacitor connected to each lamp independently, such that each lamp can be controlled separately with respect to illumination time and intensity. A method for exposing substrates to ultraviolet light, and a method for calibrating the lamp exposure system are also disclosed.

Abstract: A double-sided exposure apparatus is disclosed. The apparatus incorporates a phototool die set that provides high accuracy, speed and smooth operation with minimal particulate contamination of the exposure zone while allowing conventional work piece transport and handling. Upper and lower die halves are supported by four corner posts, guided by precision preloaded bearings to obtain high accuracy in front to back registration of art works maintained in the upper and lower die halves. The die halves are reversibly separated by upward motion actuated by a closed loop servo motor and lead screw system simultaneously elevating the four corner posts to which the upper die half is rigidly attached.