Patents by Inventor Greg Bettencourt
Greg Bettencourt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8268117Abstract: A silicon-based showerhead electrode is provided that can include a backside, a frontside, and a plurality of showerhead passages extending from the backside of the silicon-based showerhead electrode to the frontside of the silicon-based showerhead electrode. The silicon-based showerhead electrode can comprise single crystal silicon. The silicon-based showerhead electrode may further include a plurality of partial recesses formed within the single crystal silicon along the backside of the silicon-based showerhead electrode. The plurality of partial recesses can leave a thickness of single crystal silicon between each of the partial recesses and the frontside of the silicon-based showerhead electrode.Type: GrantFiled: March 1, 2012Date of Patent: September 18, 2012Assignee: Lam Research CorporationInventors: Greg Bettencourt, Raj Dhindsa, George Diercks, Randall A. Hardin, Jon Keihl, Duane Lytle, Alexei Marakhtanov, Roger Patrick, John Pegg, Shannon Spencer
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Patent number: 8216418Abstract: The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, a thermally conductive gasket, and a plurality of o-rings, wherein respective profiles of a frontside of the thermal control plate and a backside of the showerhead electrode cooperate to define a thermal interface. The thermally conductive gasket and the o-rings are positioned along this thermal interface with the o-rings separating the thermally conductive gasket from the showerhead passages such that the gasket is isolated from the showerhead passages. The gasket may facilitate heat transfer across the thermal interface from the showerhead electrode to the thermal control plate.Type: GrantFiled: April 30, 2008Date of Patent: July 10, 2012Assignee: Lam Research CorporationInventors: Roger Patrick, Raj Dhindsa, Greg Bettencourt, Alexei Marakhtanov
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Publication number: 20120160941Abstract: A silicon-based showerhead electrode is provided that can include a backside, a frontside, and a plurality of showerhead passages extending from the backside of the silicon-based showerhead electrode to the frontside of the silicon-based showerhead electrode. The silicon-based showerhead electrode can comprise single crystal silicon. The silicon-based showerhead electrode may further include a plurality of partial recesses formed within the single crystal silicon along the backside of the silicon-based showerhead electrode. The plurality of partial recesses can leave a thickness of single crystal silicon between each of the partial recesses and the frontside of the silicon-based showerhead electrode.Type: ApplicationFiled: March 1, 2012Publication date: June 28, 2012Applicant: LAM RESEARCH CORPORATIONInventors: Greg Bettencourt, Raj Dhindsa, George Diercks, Randall A. Hardin, Jon Keihl, Duane Lytle, Alexei Marakhtanov, Roger Patrick, John Pegg, Shannon Spencer
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Patent number: 8187413Abstract: The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and a thermally conductive gasket, wherein respective profiles of a frontside of the thermal control plate and a backside of the showerhead electrode cooperate to define a disjointed thermal interface comprising portions proximal to showerhead passages of the showerhead electrode and portions displaced from the showerhead passages. The displaced portions are recessed relative to the proximal portions and are separated from the showerhead passages by the proximal portions of the thermal interface.Type: GrantFiled: March 18, 2008Date of Patent: May 29, 2012Assignee: Lam Research CorporationInventors: Roger Patrick, Raj Dhindsa, Greg Bettencourt, Alexei Marakhtanov
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Patent number: 8152954Abstract: The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts.Type: GrantFiled: October 12, 2007Date of Patent: April 10, 2012Assignee: Lam Research CorporationInventors: Greg Bettencourt, Raj Dhindsa, George Diercks, Randall A. Hardin, Jon Keihl, Duane Lytle, Alexei Marakhtanov, Roger Patrick, John Pegg, Shannon Spencer
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Publication number: 20090236040Abstract: The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and a thermally conductive gasket, wherein respective profiles of a frontside of the thermal control plate and a backside of the showerhead electrode cooperate to define a disjointed thermal interface comprising portions proximal to showerhead passages of the showerhead electrode and portions displaced from the showerhead passages. The displaced portions are recessed relative to the proximal portions and are separated from the showerhead passages by the proximal portions of the thermal interface.Type: ApplicationFiled: March 18, 2008Publication date: September 24, 2009Applicant: LAM RESEARCH CORPORATIONInventors: Roger Patrick, Raj Dhindsa, Greg Bettencourt, Alexei Marakhtanov
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Publication number: 20090095424Abstract: The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts.Type: ApplicationFiled: October 12, 2007Publication date: April 16, 2009Applicant: LAM RESEARCH CORPORATIONInventors: Greg Bettencourt, Raj Dhindsa, George Diercks, Randall A. Hardin, Jon Keihl, Duane Lytle, Alexei Marakhtanov, Roger Patrick, John Pegg, Shannon Spencer
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Publication number: 20080308229Abstract: The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, a thermally conductive gasket, and a plurality of o-rings, wherein respective profiles of a frontside of the thermal control plate and a backside of the showerhead electrode cooperate to define a thermal interface. The thermally conductive gasket and the o-rings are positioned along this thermal interface with the o-rings separating the thermally conductive gasket from the showerhead passages such that the gasket is isolated from the showerhead passages. The gasket may facilitate heat transfer across the thermal interface from the showerhead electrode to the thermal control plate.Type: ApplicationFiled: April 30, 2008Publication date: December 18, 2008Applicant: LAM RESEARCH CORPORATIONInventors: Roger Patrick, Raj Dhindsa, Greg Bettencourt, Alexei Marakhtanov
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Publication number: 20040162007Abstract: A substrate polishing system includes a delivery arm having a nozzle configured to combine a rinse fluid and a gas into an atomized spray, and to direct the atomized spray toward a polishing pad. The atomization process causes droplets of the rinse agent in the atomized spray to become negatively charged. The negative charge causes in the rinse agent to adhere to waste particles and slurry, which facilitates removal thereof from the polishing pad.Type: ApplicationFiled: February 19, 2003Publication date: August 19, 2004Inventors: Ky Phan, Xuyen Pham, Greg Bettencourt, Ren Zhou