Abstract: Metering service instances collect predefined types of metering events on the nodes in which the service instances process. Within each node, the events are statistically filtered, aggregated, and collected. The events are also passed to audit logs. At the conclusion of a metering period or upon detection of a batching event, the aggregated statistically filtered events (statistics) are forward to a collecting cluster where they are populated to a metering statistic data store.

Abstract: Metering service instances collect predefined types of metering events on the nodes in which the service instances process. Within each node, the events are statistically filtered, aggregated, and collected. The events are also passed to audit logs. At the conclusion of a metering period or upon detection of a batching event, the aggregated statistically filtered events (statistics) are forward to a collecting cluster where they are populated to a metering statistic data store.

Abstract: Apparatus, systems, and methods may operate to receive, from a node associated with a console owner, an authenticated access request for access to a network portal. Additional activities may include accessing a branding file associated with the console owner, and responsive to the receiving, generating a branded version of a graphical user interface having one or more background colors, a display structure, and a set of uncolored icons. The background color(s) and the icons may be selected based on information stored in the branding file. The branded version may be published to grant access to the network portal, displaying the uncolored icons in front of the background color(s) so that the background color(s) are visible through transparent portions of the uncolored icons. Additional apparatus, systems, and methods are disclosed.

Abstract: Apparatus, systems, and methods may operate to receive, from a node associated with a console owner, an authenticated access request for access to a network portal. Additional activities may include accessing a branding file associated with the console owner, and responsive to the receiving, generating a branded version of a graphical user interface having one or more background colors, a display structure, and a set of uncolored icons. The background color(s) and the icons may be selected based on information stored in the branding file. The branded version may be published to grant access to the network portal, displaying the uncolored icons in front of the background color(s) so that the background color(s) are visible through transparent portions of the uncolored icons. Additional apparatus, systems, and methods are disclosed.

Abstract: The present invention provides for a method and an apparatus for controlling plasma photoresist removal processes. At least one manufacturing run of semiconductor devices is processed. Environmental data is acquired in response to processing the semiconductor devices. Metrology data is acquired in response to processing the semiconductor devices. The method further comprises performing residual gas analysis based upon the acquired environmental data and the acquired metrology data.

Abstract: The present invention provides for a method and an apparatus for control of final critical dimensions during processing of semiconductor wafers. A manufacturing run of semiconductor devices is processed. Metrology data from the processed semiconductor devices is acquired. A final critical dimension control adjustment process is performed using the acquired metrology data. A feedback/feed-forward modification process is performed in response to the final critical dimension control adjustment process.

Abstract: A method is provided for manufacturing, the method including processing a workpiece in a plurality of processing steps and measuring characteristics of the processing performed on the workpiece in at least two of the plurality of processing steps. The method also includes displaying the characteristics measured by overlaying the characteristics measured at each of the at least two of the plurality of processing steps to display a final resulting workpiece.

Abstract: A method for controlling uniformity in a wafer is provided. A wafer is provided. A layer of photoresist is formed on the wafer, and the photoresist layer is patterned. A portion of the patterned photoresist layer is illuminated in at least first and second positions. Light reflected at the two positions is measured to generate first and second measurements. A recipe of a stepper is adjusted in response to the first measurement differing from the second measurement. A wafer processing system includes a stepper, a scatterometer, and a process controller. The stepper is adapted to expose a layer of photoresist in accordance with a recipe to generate an exposed layer of photoresist. The scatterometer is adapted to take first and second measurements in at least first and second positions on the exposed layer of photoresist. The process controller is adapted to compare the first and second measurements and adjust the recipe based on the first and second measurements.