Patents by Inventor Greg Harms

Greg Harms has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250375160
    Abstract: A circumaural headset includes a circumaural assembly having a physiologic sensor integrated within a generally U-shaped cuff having a formable wire frame encapsulated in a molded material and secured by a connector to an earcup of the circumaural assembly. The U-shaped cuff includes formable side portions to grip corresponding sides of a circumaural ear seal with a top portion of the cuff connecting the formable side portions and extending across a face surface of the circumaural ear seal, which is secured directly or indirectly to the earcup. The physiologic sensor is removably physically connected by a strain-relief plug of the connector to a corresponding molded socket within a faceplate of the earcup and electrically connected to one or more processors programmed to process signals from the physiologic sensor and provide an audible alert via at least one of the circumaural assemblies in response to sensor data.
    Type: Application
    Filed: June 9, 2025
    Publication date: December 11, 2025
    Applicant: LIGHTSPEED AVIATION, INC.
    Inventors: Brian David FROST, Allan SCHRADER, Greg HARMS, Trent AMPOMAH
  • Publication number: 20120070362
    Abstract: A method for quantitatively monitoring gas phase materials in a chemical process is provided and includes, providing a gaseous feed stream containing one or more reactant gases of interest; exposing the gaseous feed stream to coherent radiation from a Raman spectroscopic device; acquiring a Raman spectroscopic signal from each of the gaseous components in the feed stream; analyzing the spectroscopic signal to determine the presence and concentration of each of the gaseous components; and displaying the results of the analysis. In one embodiment, the method is useful for quantitatively monitoring gas phase materials in a process for making high purity silicon.
    Type: Application
    Filed: May 11, 2010
    Publication date: March 22, 2012
    Applicants: HEMLOCK SEMICONDUCTOR CORPORATION, DOW CORNING CORPORATION
    Inventors: Greg Harms, Douglas Kreszowski, David Licht, Elmer Lipp, Michael Molnar, Marc Pinet