Patents by Inventor Gregg Anthony Inderhees

Gregg Anthony Inderhees has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Inspecting high-resolution photolithography masks
    Patent number: 9619878
    Abstract: Optical inspection methods and apparatus for high-resolution photomasks using only a test image. A filter is applied to an image signal received from radiation that is transmitted by or reflected from a photomask having a test image. The filter may be implemented using programmed control to adjust and control filter conditions, illumination conditions, and magnification conditions.
    Type: Grant
    Filed: April 11, 2014
    Date of Patent: April 11, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Fred Stanke, Ilya Toytman, David Alles, Gregg Anthony Inderhees, Stanley E. Stokowski, Mehdi Vaez-Iravani
  • INSPECTING HIGH-RESOLUTION PHOTOLITHOGRAPHY MASKS
    Publication number: 20140307943
    Abstract: Optical inspection methods and apparatus for high-resolution photomasks using only a test image. A filter is applied to an image signal received from radiation that is transmitted by or reflected from a photomask having a test image. The filter may be implemented using programmed control to adjust and control filter conditions, illumination conditions, and magnification conditions.
    Type: Application
    Filed: April 11, 2014
    Publication date: October 16, 2014
    Applicant: KLA-Tencor Corporation
    Inventors: Fred Stanke, Ilya Toytman, David Alles, Gregg Anthony Inderhees, Stanley E. Stokowski, Mehdi Vaez-Iravani