Patents by Inventor Gregory A. Cherry
Gregory A. Cherry has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160132981Abstract: Methods, systems, and kits for an emergency planning system. In one aspect, a method includes selecting a geographic location, receiving an aerial representation of the geographic location, overlaying the aerial representation with at least one icon, generating location emergency data for the geographic location based on the aerial representation and the at least one icon overlay, and publishing the location emergency data. Other aspects include receiving an emergency request associated with the geographic location, querying at least one database for the location emergency data associated with the geographic location, receiving the location emergency data for the geographic location on at least one user device, condensed information sheets, materials sheets, preprinted icon sheets for overlaying aerial representation, accessing location emergency data on user device(s) by emergency services, and/or integration of GPS and/or other telemetry measurements.Type: ApplicationFiled: August 17, 2015Publication date: May 12, 2016Inventors: Tina M. Cherry, Gregory A. Cherry
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Patent number: 8190391Abstract: A method includes receiving a first set of parameters associated with a plurality of die. A first die performance metric associated with a selected die is determined based on the first set of parameters. At least one neighborhood die performance metric associated with a set comprised of a plurality of die that neighbor the selected die is determined based on the first set of parameters. A second die performance metric is determined for the selected die based on the first die performance metric and the neighborhood die performance metric.Type: GrantFiled: March 29, 2007Date of Patent: May 29, 2012Assignee: GLOBALFOUNDRIES Inc.Inventors: Daniel Kadosh, Gregory A. Cherry, Carl I. Bowen, Luis De La Fuente, Rajesh Vijayaraghavan
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Patent number: 8017411Abstract: A method and an apparatus for dynamically adjusting a sampling rate relating to wafer examination. A process step is performed upon a plurality of workpieces associated with a lot. A sample rate for acquiring metrology data relating to at least one of the processed workpiece is determined. A dynamic sampling rate adjustment process is performed to adaptively modify the sample rate. The dynamic sampling rate adjustment process includes comparing a predicted process outcome and an actual process outcome and modifying the sampling rate based upon the comparison.Type: GrantFiled: December 18, 2002Date of Patent: September 13, 2011Assignee: GlobalFoundries, Inc.Inventors: Thomas J. Sonderman, Alexander J. Pasadyn, Gregory A. Cherry
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Publication number: 20080262769Abstract: A method includes receiving a first set of parameters associated with a particular die. A health metric for a particular die is determined using a multivariate analysis of the first set of parameters. The health metric incorporates at least one performance metric. At least one of a market segment designator or a testing plan associated with the particular die is determined based on the health metric.Type: ApplicationFiled: April 23, 2007Publication date: October 23, 2008Inventors: DANIEL KADOSH, Gregory A. Cherry, Carl L. Bowen, Luis De La Fuente, Rajesh Vijayaraghavan
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Publication number: 20080244348Abstract: A method includes receiving a first set of parameters associated with a plurality of die. A first die performance metric associated with a selected die is determined based on the first set of parameters. At least one neighborhood die performance metric associated with a set comprised of a plurality of die that neighbor the selected die is determined based on the first set of parameters. A second die performance metric is determined for the selected die based on the first die performance metric and the neighborhood die performance metric.Type: ApplicationFiled: March 29, 2007Publication date: October 2, 2008Inventors: Daniel Kadosh, Gregory A. Cherry, Carl Bowen, Luis De La Fuente, Rajesh Vijayaraghavan
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Publication number: 20080172189Abstract: A method includes receiving a first set of parameters associated with a subset of a plurality of die on a wafer subjected to testing. The first set of data is expanded to generate estimated values for the first set of parameters for at least one untested die not included in the subset. A die health metric is determined for at least a portion of the plurality of die based on the first set of parameters including the estimated values.Type: ApplicationFiled: January 16, 2007Publication date: July 17, 2008Inventors: Daniel Kadosh, Gregory A. Cherry, Carl Bowen, Luis De La Fuente, Rajesh Vijayaraghavan
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Patent number: 7340318Abstract: A method includes providing a process controller for controlling a process tool. The process tool is controlled in accordance with a process parameter. Measurements associated with the processing parameter for a plurality of runs of the process tool are accessed. A performance measure for the process controller is generated based on the process parameter and the measurements. A system includes a process tool, a process controller, and a performance monitor. The process controller is configured to control the process tool in accordance with a process parameter. The performance monitor is configured to retrieve measurements associated with the processing parameter for a plurality of runs of the process tool and generate a performance measure for the process controller based on the measured processing parameters.Type: GrantFiled: December 20, 2002Date of Patent: March 4, 2008Assignee: Advanced Micro Devices, Inc.Inventors: Gregory A. Cherry, Ernest D. Adams, III
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Patent number: 7248939Abstract: The present invention provides a method and apparatus for multivariate fault identification and classification. The method includes accessing data indicative of a plurality of physical parameters associated with a plurality of processed semiconductor wafers and providing at least one summary report including information indicative of at least one univariate representation of the accessed data and at least one multivariate representation of the accessed data.Type: GrantFiled: January 13, 2005Date of Patent: July 24, 2007Assignee: Advanced Micro Devices, Inc.Inventors: Kevin Andrew Chamness, Daniel Kadosh, Gregory A. Cherry, Jason Williams
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Patent number: 7198964Abstract: A method for identifying faults in a semiconductor fabrication process includes storing measurements for a plurality of parameters of a wafer in the semiconductor fabrication process. A first subset of the parameters is selected. The subset is associated with a feature formed on the wafer. A principal component analysis model is applied to the first subset to generate a performance metric. A fault condition with the wafer is identified based on the performance metric. A system includes a data store and a fault monitor. The data store is adapted to store measurements for a plurality of parameters of a wafer in a semiconductor fabrication process. The fault monitor is adapted to select a first subset of the parameters, the subset being associated with a feature formed on the wafer, apply a principal component analysis model to the first subset to generate a performance metric, and identify a fault condition with the wafer based on the performance metric.Type: GrantFiled: February 3, 2004Date of Patent: April 3, 2007Assignee: Advanced Micro Devices, Inc.Inventors: Gregory A. Cherry, Daniel Kadosh
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Patent number: 7100081Abstract: A method includes receiving a current residual vector. The current residual vector is compared to a plurality of historical residual vectors. Each historical residual vector has an associated fault classification code. At least one of the historical residual vectors is selected responsive to determining that the current residual vector matches at least one of the historical residual vectors. A fault condition is classified based on the fault classification code associated with the selected historical residual vector.Type: GrantFiled: October 9, 2003Date of Patent: August 29, 2006Assignee: Advanced Micro Devices, Inc.Inventors: Matthew A. Purdy, Robert J. Chong, Gregory A. Cherry, Richard J. Markle
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Patent number: 7050879Abstract: A method and an apparatus are provided for adjusting a sampling protocol in an adaptive control process. The method comprises determining a performance value based on a measurement associated with at least one or more previously processed workpieces, adjusting a sampling protocol for one or more processed workpieces based on the determined performance value, and measuring the one or more processed workpieces according to the sampling protocol to provide one or more measurements. The method further comprises adjusting at least one of a process model and a control parameter based on at least a portion of the one or more measurements.Type: GrantFiled: April 3, 2003Date of Patent: May 23, 2006Assignee: Advanced Micro Devices, Inc.Inventors: Jin Wang, Gregory A. Cherry
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Patent number: 7043403Abstract: A method and apparatus is provided for fault detection and classification based on calculating distances between data points. The method comprises receiving a data sample representative of measurements of one or more variables associated with a process operation, determining a distance between the data sample and one or more data points of a history data of the process operation and detecting a fault associated with the process operation based on the distance between the data sample and the one or more data points of the history data.Type: GrantFiled: September 4, 2002Date of Patent: May 9, 2006Assignee: Advanced Micro Devices, Inc.Inventors: Jin Wang, Gregory A. Cherry
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Publication number: 20060027071Abstract: The invention is a single and/or musical instrument based on Tensegrity structures. It shows how a simple retying of a traditional Tensegrity, comprising a plurality of single shaped and/or multi-shaped struts, results in the creation of a single and/or multi-toned musical device, in which the compression struts of traditional Tensegrities become musical instruments. The simple retying involves moving the tie point of the struts from their usual place, at the strut ends, into one of the nodal minima's for the desired strut resonance mode. Another way of viewing this transformation is to imagine lengthening the strut beyond the ends where the strut is tied until the tie points are at resonant nodal minima's. What is left after the transformation is that all of the structural properties of a Tensegrity are maintained, while any of the struts tat were retied in the transformation become musical chimes that sound oust a musical note, or combination of notes when struck with a playing hammer.Type: ApplicationFiled: August 4, 2005Publication date: February 9, 2006Inventors: Ronald Barnett, Gregory Cherry
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Patent number: 6991945Abstract: A method and apparatus is provided for fault detection spanning multiple processes. The method comprises receiving operational data associated with a first process, receiving operational data associated with a second process, which is downstream to the first process and performing fault detection analysis based on the operational data associated with the first process and second process using a common fault detection unit.Type: GrantFiled: August 30, 2002Date of Patent: January 31, 2006Assignee: Advanced Micro Devices, Inc.Inventors: Howard E. Castle, Matthew A. Purdy, Gregory A. Cherry, Richard J. Markle, Eric O. Green, Michael L. Miller, Brian K. Cusson
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Patent number: 6959224Abstract: A method includes defining a model of a process for manufacturing a device, the process including a plurality of steps. A plurality of inline process targets are defined for at least a subset of the process steps. The model relates the inline process targets to a plurality of process output parameters. A first set of probabilistic constraints for the inline process targets is defined. A second set of probabilistic constraints for the process output parameters is defined. An objective function is defined based on the model and the plurality of process output parameters. A trajectory of the process output parameters is determined by optimizing the objective function subject to the first and second sets of probabilistic constraints for each process step to determine values for the inline process targets at each process step, the optimization being iterated after completion of each process step for the remaining process steps.Type: GrantFiled: January 2, 2003Date of Patent: October 25, 2005Assignee: Advanced Micro Devices, Inc.Inventors: Richard P. Good, Gregory A. Cherry, Jin Wang
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Patent number: 6871114Abstract: A method and an apparatus for adjusting a process controller based upon a fault detection analysis. A process step upon a workpiece is performed using a processing tool. Manufacturing data relating to processing of the workpiece is acquired. The manufacturing data may include metrology data relating to the processed workpiece and/or tool state data relating to the tool state of a processing tool. A metrology/tool state data integration process is performed based upon the acquired manufacturing data. The metrology/tool state data integration process includes performing an assessment of a tool health related to the processing tool and adjusting an emphasis of the metrology data based upon the assessment of the tool health.Type: GrantFiled: August 30, 2002Date of Patent: March 22, 2005Inventors: Eric O. Green, Matthew A. Purdy, Elfido Coss, Jr., Christopher A. Bode, Robert J. Chong, Gregory A. Cherry
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Patent number: 6810296Abstract: A method and an apparatus for dynamic targeting for a process control system. Inline parameter data relating to a processed workpiece is received. A determination is made whether the inline parameter would result in a value of a device operation parameter within a predetermined range. At least one process operation performed upon the workpiece is adjusted in response to a determination that the inline parameter would not result in a value of the device operation parameter.Type: GrantFiled: September 25, 2002Date of Patent: October 26, 2004Assignee: Advanced Micro Devices, Inc.Inventors: Christopher A. Bode, Gregory A. Cherry, Rick Good
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Publication number: 20040121495Abstract: A method and an apparatus for dynamically adjusting a sampling rate relating to wafer examination. A process step is performed upon a plurality of workpieces associated with a lot. A sample rate for acquiring metrology data relating to at least one of the processed workpiece is determined. A dynamic sampling rate adjustment process is performed to adaptively modify the sample rate. The dynamic sampling rate adjustment process includes comparing a predicted process outcome and an actual process outcome and modifying the sampling rate based upon the comparison.Type: ApplicationFiled: December 18, 2002Publication date: June 24, 2004Inventors: Thomas J. Sonderman, Alexander J. Pasadyn, Gregory A. Cherry
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Patent number: 6740534Abstract: A method and an apparatus for the determination of a process flow based upon fault detection. A process step upon a workpiece is performed. Fault detection analysis based upon the process step performed upon the workpiece is performed. A workpiece routing process is performed based upon the fault detection analysis. The wafer routing process includes using a controller to perform one or a rework process routing, a non-standard process routing, a fault verification process routing, a normal process routing, or a termination process routing, based upon the fault detection analysis.Type: GrantFiled: September 18, 2002Date of Patent: May 25, 2004Assignee: Advanced Micro Devices, Inc.Inventors: Ernest D. Adams, III, Matthew A. Purdy, Gregory A. Cherry, Eric O. Green, Elfido Coss, Jr., Brian K. Cusson, Naomi M. Jenkins, Patrick M. Cowan
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Publication number: 20040093107Abstract: A method includes defining a model of a process for manufacturing a device, the process including a plurality of steps. A plurality of inline process targets are defined for at least a subset of the process steps. The model relates the inline process targets to a plurality of process output parameters. A first set of probabilistic constraints for the inline process targets is defined. A second set of probabilistic constraints for the process output parameters is defined. An objective function is defined based on the model and the plurality of process output parameters. A trajectory of the process output parameters is determined by optimizing the objective function subject to the first and second sets of probabilistic constraints for each process step to determine values for the inline process targets at each process step, the optimization being iterated after completion of each process step for the remaining process steps.Type: ApplicationFiled: January 2, 2003Publication date: May 13, 2004Inventors: Richard P. Good, Gregory A. Cherry, Jin Wang