Abstract: A process for etching a sacrificial layer of a structure. The structure is exposed to a plasma derived from nitrogen trifluoride for etching the sacrificial layer. The process is selective in that it etches titanium-nitride and titanium but does not affect adjacent silicon dioxide or aluminum layers. Applications of the process include the formation of integrated circuit structures and MEMS structures.

Abstract: A process for etching a sacrificial layer of a structure. The structure is exposed to a plasma derived from nitrogen trifluoride for etching the sacrificial layer. The process is selective in that it etches titanium-nitride and titanium but does not affect adjacent silicon dioxide or aluminum layers. Applications of the process include the formation of integrated circuit structures and MEMS structures.

Abstract: A CNC machine tool control system that includes a controllable, movable tool for shaping a workpiece, a mechanism for receiving control instructions describing shaping functions to be performed on the workpiece, a processing unit and memory. The control systems includes objects defined according to an object oriented design. One type of object is a model of a shaping process to be performed on a workpiece, including informational parameters regarding the physical dimensions of the shape resulting from the process. The process objects communicates through an object oriented messaging system to machine objects, which represent physical devices present on the CNC machine on which the control system operates. The system also includes object oriented motion control and exception handler objects, each of which may communication with other object via object oriented messages.