Patents by Inventor Gregory Atwood

Gregory Atwood has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5828616
    Abstract: Methods and apparatus for determining the state of a memory cell having more than two possible states are disclosed. For a first embodiment, the state of a flash cell having n states, where n is a power of 2, is determined by selectively comparing the threshold voltage V.sub.t of a selected memory cell to (n-1) reference voltages. For every two states, a single comparator is provided such that the total number of comparators is equal to the number of bits stored in the memory cell.
    Type: Grant
    Filed: February 19, 1997
    Date of Patent: October 27, 1998
    Assignee: Intel Corporation
    Inventors: Mark E. Bauer, Sanjay Talreja, Albert Fazio, Gregory Atwood, Johnny Javanifard, Kevin W. Frary
  • Patent number: 5748546
    Abstract: Methods and apparatus for determining the state of a memory cell having more than two possible states are disclosed. For a first embodiment, the state of a flash cell having n states, where n is a power of 2, is determined by selectively comparing the threshold voltage V.sub.t of a selected memory cell to (n-1) reference voltages. For every two states, a single comparator is provided such that the total number of comparators is equal to the number of bits stored in the memory cell.
    Type: Grant
    Filed: April 10, 1997
    Date of Patent: May 5, 1998
    Assignee: Intel Corporation
    Inventors: Mark E. Bauer, Sanjay Talreja, Kevin W. Frary, Gregory Atwood, Albert Fazio, Johnny Javanifard
  • Patent number: 5210047
    Abstract: A process for fabricating an electrically programmable read-only memory array having increased density includes forming recessed field oxide regions in a silicon substrate. Elongated parallel wordline stacks are then formed over the surface of the substrate. Source and drain regions are formed by ion implantation in the openings between these vertical stacks. These openings are then filled with a metal layer until the wafer is substantially planar. This metal layer is then patterned to form drain contact pads and V.sub.SS interconnect strips. The V.sub.SS interconnect strips contact adjacent source regions across field oxide regions that insulate adjacent memory cells.
    Type: Grant
    Filed: December 12, 1991
    Date of Patent: May 11, 1993
    Inventors: Been-Jon K. Woo, Gregory Atwood, Stefan K. C. Lai, T. C. Ong