Patents by Inventor Gregory Domenic Spaziano

Gregory Domenic Spaziano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation sensitive copolymers, photoresist compositions thereof and deep UV bilayer systems thereof
    Patent number: 6165682
    Abstract: Radiation sensitive resins for use in a top layer resists in bilayer systems for use in deep UV photolithography comprises copolymers having the following structural units: ##STR1## and optionally, ##STR2## wherein n is an integer of 1 to 5, R.sup.1 is methyl or trimethylsiloxy, R.sup.2 is a tert-butyl group, R.sup.3, R.sup.4 and R.sup.5 are each independently hydrogen or a methyl group.
    Type: Grant
    Filed: September 22, 1999
    Date of Patent: December 26, 2000
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Patrick Foster, John Joseph Biafore, Gregory Domenic Spaziano