Patents by Inventor Gregory Martin Mason Corcoran

Gregory Martin Mason Corcoran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130045447
    Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
    Type: Application
    Filed: August 15, 2012
    Publication date: February 21, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
  • Publication number: 20120013865
    Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
    Type: Application
    Filed: July 14, 2011
    Publication date: January 19, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thibault Simon Mathieu LAURENT, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendricus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
  • Publication number: 20100290013
    Abstract: An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.
    Type: Application
    Filed: April 15, 2010
    Publication date: November 18, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christophe DE METSENAERE, Ronald Casper Kunst, Paul Petrus Joannes Berkvens, Mauritius Gerardus Elisabeth Schneiders, Jimmy Matheus Wilhelmus Van De Winkel, Gregory Martin Mason Corcoran
  • Publication number: 20100259735
    Abstract: A fluid handling system for an immersion lithographic apparatus that has a fluid removal device to remove immersion liquid from an immersion space, and a droplet removal device to remove a droplet of immersion liquid, wherein: the droplet removal device is located further from an optical axis than the fluid removal device, and the droplet removal device comprises a porous member which faces, e.g., the substrate being exposed and/or the substrate table.
    Type: Application
    Filed: April 8, 2010
    Publication date: October 14, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Erik Henricus Egidius Catharina Eummelen, Koen Steffens, Takeshi Kaneko, Gregory Martin Mason Corcoran