Abstract: The present invention presents three new classes of phase-shifting mask patterns. In optical image forming systems, a mask with phase shifted regions can act as a precision instrument for characterizing imaging. Three new classes of phase-shifting mask patterns have been invented to characterize projection printing tool illumination and phase-shifting mask (PSM) performance. The linear phase grating (LPG) and linear phase ring (LPR) both serve to characterize illumination angular distribution and uniformity. A third new class, the interferometric-probe monitor for phase-shifting masks (IPM-PSM), measures the effective phase, transmittance and edge effects of various phase-shifted mask features. All three patterns allow performance comparison across the field, tool-to-tool, over time, or to intended design.

Abstract: A method to monitor the state of polarization incident on the photomask in projection printing is presented. The method includes a series of phase-shifting mask patterns that take advantage of high NA effects to create a signal dependent on only one incident polarization component. The patterns exist in two embodiments: a Radial Phase Grating (RPG) and Proximity Effect Polarization Analyzers (PEPA). The PEPAs are derived from basic principles and are theoretically the most sensitive patterns to polarization. A polarimeter is then constructed of six patterns of either embodiment that, when properly calibrated, is sufficient to measure the Stokes parameters of the incident illumination. A test reticle design is proposed, consisting of multiple polarimeters with an array of pinholes on the backside of the photomask. This technique is able to monitor any arbitrary illumination scheme for a particular tool. Calibration of the test mask is required.