Patents by Inventor Gregory Prokopowicz

Gregory Prokopowicz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230348635
    Abstract: There is provided a resin composition from a mixture including: (a) 60-90 weight % of at least one thermosetting resin; and (b) 10-40 weight % of at least one aryl ether resin. The resin composition can be used in electronics applications.
    Type: Application
    Filed: April 28, 2022
    Publication date: November 2, 2023
    Inventors: Colin HAYES, Michael K. GALLAGHER, Gregory PROKOPOWICZ
  • Publication number: 20070072112
    Abstract: In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium, hafnium, indium or zinc compounds. In another aspect, coating compositions are provided that comprise a plurality of discrete particles. Preferred coating compositions of the invention are useful for antireflective purposes, particularly with an underlaying photoresist coating layer, as well as for a barrier layer in immersion lithography.
    Type: Application
    Filed: May 4, 2006
    Publication date: March 29, 2007
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Gregory Prokopowicz, Michael Gallagher
  • Publication number: 20060204742
    Abstract: Methods for depositing uniform, pinhole-defect free organic polysilica coatings are provided. These methods allow for the use of these materials as spin-on cap layers in the manufacture of integrated circuits.
    Type: Application
    Filed: March 23, 2006
    Publication date: September 14, 2006
    Applicant: Shipley Company, L.L.C.
    Inventors: Dana Gronbeck, Michael Gallagher, Jeffrey Calvert, Gregory Prokopowicz, Timothy Adams
  • Publication number: 20060105272
    Abstract: The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.
    Type: Application
    Filed: July 1, 2005
    Publication date: May 18, 2006
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Michael Gallagher, Gerald Wayton, Gregory Prokopowicz, Stewart Robertson
  • Publication number: 20060069171
    Abstract: Compositions useful in the preparation of porous organic polysilica films, particularly for use in the manufacture of integrated circuits, are provided. Methods of forming such compositions and films are also provided.
    Type: Application
    Filed: September 7, 2005
    Publication date: March 30, 2006
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Gregory Prokopowicz, Michael Gallagher
  • Publication number: 20050089642
    Abstract: A method of preparing an organic polysilica partial condensate using basic and acidic catalysts is provided. Upon curing, such organic polysilica material has improved mechanical properties.
    Type: Application
    Filed: October 27, 2004
    Publication date: April 28, 2005
    Applicant: Rohm and Haas Electronic Materials, L.L.C.
    Inventors: Timothy Adams, Hongshi Zhen, Gregory Prokopowicz, Michael Gallagher