Patents by Inventor Gregory Redinbo

Gregory Redinbo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Active particle trapping for process control
    Patent number: 8461552
    Abstract: A particle isolation system includes a semiconductor process chamber; at least one member within the semiconductor process chamber wherein the member has at least a first position and a second position; and at least one isolation compartment having a plurality of walls, the isolation compartment defined by the plurality of walls, at least one of the plurality of walls of the isolation compartment defining at least one opening wherein the member in the first position permits particles to enter the isolation compartment from the semiconductor process chamber through the opening, and wherein the member in the second position substantially encloses the isolation compartment thereby substantially retaining the particles in the isolation compartment and substantially limiting movement of the particles between the semiconductor process chamber and the isolation compartment through the opening. An ion implant system is also provided.
    Type: Grant
    Filed: November 10, 2010
    Date of Patent: June 11, 2013
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Peter Nunan, Gregory Redinbo, Julian Blake, Paul S. Buccos
  • ACTIVE PARTICLE TRAPPING FOR PROCESS CONTROL
    Publication number: 20110049359
    Abstract: A particle isolation system includes a semiconductor process chamber; at least one member within the semiconductor process chamber wherein the member has at least a first position and a second position; and at least one isolation compartment having a plurality of walls, the isolation compartment defined by the plurality of walls, at least one of the plurality of walls of the isolation compartment defining at least one opening wherein the member in the first position permits particles to enter the isolation compartment from the semiconductor process chamber through the opening, and wherein the member in the second position substantially encloses the isolation compartment thereby substantially retaining the particles in the isolation compartment and substantially limiting movement of the particles between the semiconductor process chamber and the isolation compartment through the opening. An ion implant system is also provided.
    Type: Application
    Filed: November 10, 2010
    Publication date: March 3, 2011
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Peter NUNAN, Gregory Redinbo, Julian Blake, Paul S. Buccos
  • Active particle trapping for process control
    Publication number: 20080157007
    Abstract: A particle isolation system includes a semiconductor process chamber; at least one member within the semiconductor process chamber wherein the member has at least a first position and a second position; and at least one isolation compartment having a plurality of walls, the isolation compartment defined by the plurality of walls, at least one of the plurality of walls of the isolation compartment defining at least one opening wherein the member in the first position permits particles to enter the isolation compartment from the semiconductor process chamber through the opening, and wherein the member in the second position substantially encloses the isolation compartment thereby substantially retaining the particles in the isolation compartment and substantially limiting movement of the particles between the semiconductor process chamber and the isolation compartment through the opening. An ion implant system is also provided.
    Type: Application
    Filed: December 27, 2006
    Publication date: July 3, 2008
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Peter Nunan, Gregory Redinbo, Julian Blake, Paul S. Buccos