Abstract: In one embodiment, an integrated circuit comprises at least one logic circuit supplied by a first supply voltage and at least one memory circuit coupled to the logic circuit and supplied by a second supply voltage. The memory circuit is configured to be read and written responsive to the logic circuit even if the first supply voltage is less than the second supply voltage during use. In another embodiment, a method comprises a logic circuit reading a memory cell, the logic circuit supplied by a first supply voltage; and the memory cell responding to the read using signals that are referenced to the first supply voltage, wherein the memory cell is supplied with a second supply voltage that is greater than the first supply voltage during use.

Abstract: In one embodiment, an integrated circuit comprises at least one logic circuit supplied by a first supply voltage and at least one memory circuit coupled to the logic circuit and supplied by a second supply voltage. The memory circuit is configured to be read and written responsive to the logic circuit even if the first supply voltage is less than the second supply voltage during use. In another embodiment, a method comprises a logic circuit reading a memory cell, the logic circuit supplied by a first supply voltage; and the memory cell responding to the read using signals that are referenced to the first supply voltage, wherein the memory cell is supplied with a second supply voltage that is greater than the first supply voltage during use.

Abstract: A multiprocessor integrated circuit is disclosed. A preferred embodiment of a multiprocessor chip has microprocessors formed on silicon-on-insulator regions and dynamic random access memory level-2cache memories or level-3 cache memories formed on bulk regions of the chip. A preferred embodiment includes a redundant architecture having a signal bus for coupling the microprocessors to the level-2 or level-3 cache memories in which the signal bus includes a programmable selector circuit for bypassing defective microprocessors or defective level-2 or level-3 cache memories.

Abstract: A multiprocessor integrated circuit is disclosed. A preferred embodiment of a multiprocessor chip has microprocessors formed on silicon-on-insulator regions and dynamic random access memory level-2 cache memories or level-3 cache memories formed on bulk regions of the chip. A preferred embodiment includes a redundant architecture having a signal bus for coupling the microprocessors to the level-2 or level-3 cache memories in which the signal bus includes a programmable selector circuit for bypassing defective microprocessors or defective level-2 or level-3 cache memories.

Abstract: A method of processing a semiconductor device shapes a layer buried within a substrate of the semiconductor device. This layer has a conductivity the same as that of the substrate but has a higher doping level. In this process, a region of the layer is selected and ions of an opposite conductivity to the selected layer are counter-implanted in the region so that the doping level of the region is substantially canceled. A region of the layer adjacent to the counter-implanted region retains a higher doping level. Alternative techniques are employed to protect the doped region against the counter-implant. In a first approach, the layer is doped and subsequently a mask is formed on the surface of the substrate. The mask is furnished by a part of the semiconductor device, such as a spacer which is connected to the gate electrode after the dopant layer is formed in the substrate. After the mask is formed, ions are counter-implanted with the mask protecting the doped region.