Abstract: A method of batch fabrication using established photolithographic techniques allowing nanoparticles or nanodevices to be fabricated and mounted into a macroscopic device in a repeatable, reliable manner suitable for large-scale mass production. Nanoparticles can be grown on macroscopic “modules” which can be easily manipulated and shaped to fit standard mounts in various devices.

Abstract: A method of batch fabrication using established photolithographic techniques allowing nanoparticles or nanodevices to be fabricated and mounted into a macroscopic device in a repeatable, reliable manner suitable for large-scale mass production. Nanoparticles can be grown on macroscopic “modules” which can be easily manipulated and shaped to fit standard mounts in various devices.

Abstract: The invention adds one or more surface contour(s) to the bombarded area(s) within ion columns to greatly reduce the likelihood that back sputtered material will reach the ion generating source. A number of different surface contours are disclosed including angled surfaces, surfaces defining cups to capture back sputtered material, pre-textured and forested surfaces. The different surfaces can be used in any combination. The reduction in back sputtered material reaching the ion source reduces the time to stability, greatly increases the working stability, and increases the lifespan of the source.

Abstract: A low input power consumption, compact thermal field emitter is suitable for use in electron beam systems, particularly those systems that use an array of electron beams or a miniature electron beam system. The thermal field emitter design reduces heat loss by reducing heat transfer to the base. To achieve reduced loses the design incorporates the use of high electrical resistivity, low thermal conductivity materials for construction of the filament posts and the filaments. Such materials further reduce heat loss and reduce input current requirements. In one embodiment, the base includes counterbores that reduce the heat conduction path between the filament posts and the base, and moves the contact area further from the filament.