Patents by Inventor Gregory SIU

Gregory SIU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200203197
    Abstract: The invention discloses a semiconductor multi-station processing chamber. Each of the multiple station includes a downward concave accommodation defined by walls and receives a pedestal therein. The pedestal and the walls define a first gap. A showerhead plate mounted on an upper lid above the pedestal to define a processing region. A second gap for supply swiping gas is defined between the showerhead plate and the upper lid. An isolation member is liftable between the downward concave accommodation and the showerhead plate to optionally encircle a processing region defined by the pedestal and the showerhead plate or to retract back into the downward concave accommodation. Such that, when the isolation member surrounds and encircles the processing region, the station is able to be structurally isolated from its neighboring one station.
    Type: Application
    Filed: December 12, 2019
    Publication date: June 25, 2020
    Inventors: HUAQIANG TAN, REN ZHOU, ZHUO WANG, DEZAN YANG, GIYOUL KIM, JING LI, JUNICHI ARAMI, ZHONGWU LIU, SI SHEN, BRIAN LU, SEAN CHANG, GREGORY SIU
  • Patent number: 10612135
    Abstract: Embodiments disclosed herein generally relate to systems and methods to prevent free radical damage to sensitive components in a process chamber and optimizing flow profiles. The processing chamber utilizes a cover substrate on lift pins and an inert bottom purge flow to shield the substrate support from halogen reactants. During a clean process, the cover substrate and the purge flow restricts halogen reactants from contacting the substrate support. The method of cleaning includes placing a cover substrate on a plurality of lift pins that extend through a substrate support in a processing chamber, raising the cover substrate via the lift pins to expose a space between the cover substrate and the substrate support, supplying a halogen containing gas into the processing chamber, supplying a second gas through an opening in the processing chamber, and flowing the second gas through the space between the cover substrate and the substrate support.
    Type: Grant
    Filed: July 19, 2017
    Date of Patent: April 7, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Sanjeev Baluja, Kalyanjit Ghosh, Ren-Guan Duan, Mayur G. Kulkarni, Gregory Siu, Praket P. Jha, Deenesh Padhi, Lei Guo, Wei Min Chan, Ajit Balakrishna
  • Publication number: 20180128647
    Abstract: A measuring device is provided for determining the position of a susceptor in a reactor housing. The measuring device includes a central element, which can be fastened on the susceptor at a predefined location, and a plurality of sensing arms, which protrude from the central element beyond an outer periphery of the susceptor. The sensing arms respectively include a sensing section that can be brought in touching contact with a contact zone. The contact zone is formed by an inner periphery of the reactor housing or a component arranged in the reactor housing. Using the measuring device, the position of a susceptor of a CVD reactor is determined relative to the reactor housing or a component arranged in the reactor housing.
    Type: Application
    Filed: November 10, 2016
    Publication date: May 10, 2018
    Inventors: Gi Youl Kim, Mark Chen-Lun Lin, Gregory Siu, Ki Chul Park, Jonathan David Mohn, H. William Luca, JR.
  • Publication number: 20180023193
    Abstract: Embodiments disclosed herein generally relate to systems and methods to prevent free radical damage to sensitive components in a process chamber and optimizing flow profiles. The processing chamber utilizes a cover substrate on lift pins and an inert bottom purge flow to shield the substrate support from halogen reactants. During a clean process, the cover substrate and the purge flow restricts halogen reactants from contacting the substrate support. The method of cleaning includes placing a cover substrate on a plurality of lift pins that extend through a substrate support in a processing chamber, raising the cover substrate via the lift pins to expose a space between the cover substrate and the substrate support, supplying a halogen containing gas into the processing chamber, supplying a second gas through an opening in the processing chamber, and flowing the second gas through the space between the cover substrate and the substrate support.
    Type: Application
    Filed: July 19, 2017
    Publication date: January 25, 2018
    Inventors: Sanjeev BALUJA, Kalyanjit GHOSH, Ren-Guan DUAN, Mayur G. KULKARNI, Gregory SIU, Praket P. JHA, Deenesh PADHI, Lei GUO, Wei Min CHAN, Ajit BALAKRISHNA