Abstract: A non-laser beam of electromagnetic radiation is divided into an illumination beam and a reference beam. A portion of the illumination beam is passed through, or reflected off of, a subject to create a subject distribution, and a portion of the reference beam is passed through a reference object, or reflected off a reference object reflector, to produce a reference distribution. An imaging system is used to form an aerial image of the subject distribution and the reference distribution. The resulting aerial image of the subject distribution exhibits improved resolution, depth of field and field size.

Abstract: The exposure component (10) of a photo-etching system for a semiconductor wafer (28) includes a laser (12) that shines coherent light through an expansion lens (14) and then a contraction lens (16) to supply a spherically convergent beam of light through a lensless-Fourier-transform hologram (22) and onto the semiconductor wafer (28). The wafer (28) is located tangent to a hemisphere centered on the hologram (22) that has the focal point (26) of the convergent spherical beam at the middle of its curved surface. This forms a reduced version of the source image from which the hologram (22) was formed and achieves feature sizes significantly smaller than those attainable with conventional mask-type systems employing light of the same wavelength.