Patents by Inventor Gu Hyun JUNG

Gu Hyun JUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12032013
    Abstract: Provided are a device and a method for monitoring substrates to determine a processed state of the substrates and inspecting presence of abnormality in the processed substrates. A device for inspecting substrates includes a substrate mounting part moving relative to the substrate and for mounting a substrate, a measurement part for monitoring the substrate, a control part configured to control a movement path of the measurement part so that at least some regions are monitored from positions different from each other with respect to a plurality of substrates, and an analysis part configured to determine presence of abnormality from monitoring information about the plurality of substrates.
    Type: Grant
    Filed: June 29, 2023
    Date of Patent: July 9, 2024
    Assignee: JUSUNG ENGINEERING CO., LTD.
    Inventors: Gu Hyun Jung, Young Rok Kim, Se Yong Oh, Chul Joo Hwang, Jin An Jung
  • Publication number: 20230374663
    Abstract: A substrate processing apparatus includes a process chamber including a reaction space in which at least one substrate is mounted, a transfer chamber for transferring the at least one substrate to the process chamber, and a buffer chamber including a rotating device for rotating the at least one substrate by a predetermined angle, wherein the rotating device includes a rotating plate, a rotating shaft for rotating the rotating plate by the predetermined angle, a drive unit for driving the rotating shaft, a controller for controlling the drive unit, and a plurality of substrate support members, which are disposed on the rotating plate and on which the at least one substrate is mounted.
    Type: Application
    Filed: August 5, 2023
    Publication date: November 23, 2023
    Inventors: Jong Sik KIM, Gu Hyun JUNG, Won Woo Jung
  • Publication number: 20230341454
    Abstract: Provided are a device and a method for monitoring substrates to determine a processed state of the substrates and inspecting presence of abnormality in the processed substrates. A device for inspecting substrates includes a substrate mounting part moving relative to the substrate and for mounting a substrate, a measurement part for monitoring the substrate, a control part configured to control a movement path of the measurement part so that at least some regions are monitored from positions different from each other with respect to a plurality of substrates, and an analysis part configured to determine presence of abnormality from monitoring information about the plurality of substrates.
    Type: Application
    Filed: June 29, 2023
    Publication date: October 26, 2023
    Inventors: Gu Hyun JUNG, Young Rok KIM, Se Yong OH, Chul Joo HWANG, Jin An JUNG
  • Patent number: 11726134
    Abstract: Provided are a device and a method for monitoring substrates to determine a processed state of the substrates and inspecting presence of abnormality in the processed substrates. A device for inspecting substrates includes a substrate mounting part moving relative to the substrate and for mounting a substrate, a measurement part for monitoring the substrate, a control part configured to control a movement path of the measurement part so that at least some regions are monitored from positions different from each other with respect to a plurality of substrates, and an analysis part configured to determine presence of abnormality from monitoring information about the plurality of substrates.
    Type: Grant
    Filed: December 27, 2018
    Date of Patent: August 15, 2023
    Inventors: Gu Hyun Jung, Young Rok Kim, Se Yong Oh, Chul Joo Hwang, Jin An Jung
  • Publication number: 20230051061
    Abstract: The present disclosure relates to a substrate transfer method and apparatus which controls a substrate transfer robot using position information of a substrate, when the substrate is loaded or unloaded in the substrate transfer apparatus including the substrate transfer robot. When an operation of setting a new reference value due to a change in process or hardware after setting the initial reference value for loading or unloading the substrate is requested, the substrate transfer method and apparatus can automatically perform the reference value setting operation. Therefore, the substrate transfer method and apparatus can transfer the substrate such that the substrate is located in the center of the susceptor, even though the reference value of the substrate transfer robot is not manually changed.
    Type: Application
    Filed: January 18, 2021
    Publication date: February 16, 2023
    Inventors: Gu Hyun JUNG, Jong Chul KIM, Jin An JUNG, Chul Joo HWANG, Yeong Seop BYEON
  • Publication number: 20220275514
    Abstract: Provided is a substrate processing apparatus. The positions of a first electrode and a second electrode are adjusted in advance in consideration of differences in coefficients of thermal expansion so that a short circuit created by contact between the first electrode and the second electrode is prevented even in the case in which the first electrode and the second electrode are thermally expanded during processing. Even in the case in which the first electrode and the second electrode are thermally expanded due to an increase in temperature during processing, a short circuit between the first electrode and the second electrode can be prevented, and the uniformity of a thin film can be maintained in the substrate processing apparatus for processing a large substrate.
    Type: Application
    Filed: June 11, 2020
    Publication date: September 1, 2022
    Inventors: Jae Wan LEE, Yong Hyun KIM, Yoon Jeong KIM, Yun Hoe KIM, Chang Kyun PARK, Gu Hyun JUNG, Ki Bum KIM, Seung Youb SA
  • Publication number: 20210254213
    Abstract: A substrate processing apparatus includes a process chamber including a reaction space in which at least one substrate is mounted, a transfer chamber for transferring the at least one substrate to the process chamber, and a buffer chamber including a rotating device for rotating the at least one substrate by a predetermined angle, wherein the rotating device includes a rotating plate, a rotating shaft for rotating the rotating plate by the predetermined angle, a drive unit for driving the rotating shaft, a controller for controlling the drive unit, and a plurality of substrate support members, which are disposed on the rotating plate and on which the at least one substrate is mounted.
    Type: Application
    Filed: June 24, 2019
    Publication date: August 19, 2021
    Inventors: Jong Sik KIM, Gu Hyun JUNG, Won Woo Jung
  • Publication number: 20200341049
    Abstract: Provided are a device and a method for monitoring substrates to determine a processed state of the substrates and inspecting presence of abnormality in the processed substrates. A device for inspecting substrates includes a substrate mounting part moving relative to the substrate and for mounting a substrate, a measurement part for monitoring the substrate, a control part configured to control a movement path of the measurement part so that at least some regions are monitored from positions different from each other with respect to a plurality of substrates, and an analysis part configured to determine presence of abnormality from monitoring information about the plurality of substrates.
    Type: Application
    Filed: December 27, 2018
    Publication date: October 29, 2020
    Inventors: Gu Hyun JUNG, Young Rok KIM, Se Yong OH, Chul Joo HWANG, Jin An JUNG