Patents by Inventor Guan-Jye Peng

Guan-Jye Peng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of fabricating dielectric layer
    Patent number: 6103567
    Abstract: A method of fabricating a dielectric layer which is application to be used in a capacitor. A first conductive layer is provided. A nitridation step is performed on the first conductive layer, so that a nitride layer is formed on a surface of the first conductive layer. A dielectric layer with a high dielectric constant is formed, followed by a thermal treatment and an oxygen plasma treatment to terminate dangling bonds of the dielectric layer. Consequently, oxygen is distributed on a surface of the dielectric layer and bonded with dangling bonds of the dielectric layer distributed on the surface.
    Type: Grant
    Filed: August 10, 1999
    Date of Patent: August 15, 2000
    Assignee: Vanguard International Semiconductor Corp.
    Inventors: Wong-Cheng Shih, Guan-Jye Peng, Lan-Lin Chao