Patents by Inventor Guang H. Lin

Guang H. Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6784361
    Abstract: This invention is a photovoltaic device comprising an intrinsic or i-layer of amorphous silicon and where the photovoltaic device is more efficient at converting light energy to electric energy at high operating temperatures than at low operating temperatures. The photovoltaic devices of this invention are suitable for use in high temperature operating environments.
    Type: Grant
    Filed: September 20, 2001
    Date of Patent: August 31, 2004
    Assignee: BP Corporation North America Inc.
    Inventors: David E. Carlson, Guang H. Lin, Gautam Ganguly
  • Publication number: 20020046766
    Abstract: A photovoltaic device comprising an amorphous silicon-containing i-layer that is more efficient at elevated operation temperatures than at lower operation temperatures.
    Type: Application
    Filed: September 20, 2001
    Publication date: April 25, 2002
    Inventors: David E. Carlson, Guang H. Lin, Gautam Ganguly
  • Patent number: 5242505
    Abstract: Alloys of amorphous silicon with Group VIa elements are disclosed that form high-quality materials for photovoltaic cells that are resistant to Staebler-Wronski photodegradation. Also disclosed are methods for manufacturing the alloys. The alloys can be formed as films on solid-state substrates by reacting silane gas and at least one alloying gas (H.sub.2 M, wherein M is an element from Group VIa of the periodic table), preferably with hydrogen dilution, by a glow-discharge method such as plasma-enhanced chemical vapor deposition. The alloys can have an optical bandgap energy from about 1.0 eV to about 2.3 eV, as determined by selecting one or more different Group VIa elements for alloying or by changing the concentration(s) of the alloying element(s) in the alloy. The alloys exhibit excellent light-to-dark conductivity ratios, excellent structural quality, and resistance to Staebler-Wronski degradation. They can be used as "i" type or doped for use as "p" or "n" type materials.
    Type: Grant
    Filed: December 3, 1991
    Date of Patent: September 7, 1993
    Assignee: Electric Power Research Institute
    Inventors: Guang H. Lin, Mu Z. He, Mridula Kapur, John O'M. Bockris