Patents by Inventor Guang-Yuan JIANG

Guang-Yuan JIANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11935878
    Abstract: A method for manufacturing a package structure includes providing a carrier board; providing at least one die having a top surface, a bottom surface, and a side surface on the carrier board; and forming a protective layer to cover at least a portion of the side surface of the die. The die includes a substrate, a semiconductor layer, a gate structure, a source structure and a drain structure, at least one dielectric layer, and at least one pad. The semiconductor layer is disposed on the substrate. The gate structure is disposed on the semiconductor layer. The source and the drain structures are disposed on opposite sides of the gate structure. The dielectric layer covers the gate, source, and drain structures. The pad is disposed on the dielectric layer and penetrates through the dielectric layer to electrically contact with the gate, source or drain structure.
    Type: Grant
    Filed: September 10, 2021
    Date of Patent: March 19, 2024
    Assignee: VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION
    Inventors: Hsiu-Mei Yu, Guang-Yuan Jiang, Cheng-Yi Hsieh, Wei-Chan Chang, Chang-Sheng Lin
  • Publication number: 20230420328
    Abstract: A semiconductor device includes: a substrate; a seed layer disposed on the substrate; a compound semiconductor stack layer disposed on the seed layer; and a source metal layer and a drain metal layer disposed on the compound semiconductor stack layer. The semiconductor device further includes a conductive layer at least partially covering the source metal layer and the drain metal layer, and covering opposing side surfaces of the seed layer and opposing side surfaces of the compound semiconductor stack layer. The conductive layer electrically connects the seed layer and the source metal layer.
    Type: Application
    Filed: June 23, 2022
    Publication date: December 28, 2023
    Applicant: Vanguard International Semiconductor Corporation
    Inventors: Hsiu-Mei YU, Guang-Yuan JIANG, Cheng-Yi HSIEH, Wei-Chan CHANG, Chang-Sheng LIN
  • Publication number: 20230238308
    Abstract: A semiconductor structure is provided. The semiconductor structure includes a lead frame and a sub-substrate disposed on the lead frame, wherein the thickness of the sub-substrate is between 0 and 0.5 ?m. The semiconductor structure also includes an epitaxial layer disposed on the sub-substrate. The epitaxial layer includes a buffer layer, a channel layer and a barrier layer. The buffer layer is disposed between the sub-substrate and the channel layer. The channel layer is disposed between the buffer layer and the barrier layer. The semiconductor structure further includes a device layer disposed on the barrier layer and an interconnector structure electrically connected to the epitaxial layer and/or the device layer by a through hole.
    Type: Application
    Filed: January 27, 2022
    Publication date: July 27, 2023
    Applicant: Vanguard International Semiconductor Corporation
    Inventors: Hsiu-Mei YU, Guang-Yuan JIANG, Cheng-Yi HSIEH, Wei-Chan CHANG, Chang-Sheng LIN
  • Publication number: 20230083337
    Abstract: A method for manufacturing a package structure includes providing a carrier board; providing at least one die having a top surface, a bottom surface, and a side surface on the carrier board; and forming a protective layer to cover at least a portion of the side surface of the die. The die includes a substrate, a semiconductor layer, a gate structure, a source structure and a drain structure, at least one dielectric layer, and at least one pad. The semiconductor layer is disposed on the substrate. The gate structure is disposed on the semiconductor layer. The source and the drain structures are disposed on opposite sides of the gate structure. The dielectric layer covers the gate, source, and drain structures. The pad is disposed on the dielectric layer and penetrates through the dielectric layer to electrically contact with the gate, source or drain structure.
    Type: Application
    Filed: September 10, 2021
    Publication date: March 16, 2023
    Applicant: Vanguard International Semiconductor Corporation
    Inventors: Hsiu-Mei YU, Guang-Yuan JIANG, Cheng-Yi HSIEH, Wei-Chan CHANG, Chang-Sheng LIN