Abstract: A two-dimensional locating method of a motion platform based on a magnetic steel array involves the following steps: placing more than four linear Hall sensors at any different positions within one or more polar distances of the magnetic steel array on the surface of the motion platform in a motion system; determining a magnetic flux density distribution model according to the magnetic steel array; determining the mounting positions of the above-mentioned linear Hall sensors, which are converted into phases with respect to the mass center of the motion platform; recording the magnetic flux density measured values of the linear Hall sensors as the motion proceeds; solving the phases of the mass center of the motion platform in a plane, with the measured values being served as observed quantities and the magnetic flux density distribution model being served as a computation model; and determining the position of the mass center of the motion platform with respect to an initial phase according to the phase, so a

Abstract: A dual wafer stage exchanging system for a lithographic device is disclosed, said system comprises two wafer stages running between an exposure workstation and a pre-processing workstation, and said two stages are set on a base and suspended above the upper surface of the base by air bearings. Each wafer stages is passed through by a Y-direction guide rail respectively, wherein one end of said guide rail is connected with a main driving unit and another end of said guide rail is detachably coupled with one of the two X-direction auxiliary driving units with single degree of freedom, and said two wafer stages are capable of moving in Y-direction along the guide rails and moving in X-direction under the drive of the auxiliary driving units with single degree of freedom. The position exchange of said two wafer stages can be enabled by the detachment and connection of the Y-direction guide rails and the auxiliary units with single degree of freedom.

Abstract: A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (13) operating in an exposure workstation (3) and a silicon chip (14) stage operating in a pre-processing workstation (4). The two silicon chip stages (13, 14) are provided on the same base stage (1), and suspended on an upper surface (2) of the base stage by air bearings. The two silicon chip stages (13, 14) can move along guide rails (15, 16) in the Y direction. One end of each guide rail (15, 16) is connected to a main driving unit (11, 12), and the other end of each guide rail (15, 16) is butt-jointed with an X-direction single-freedom auxiliary driving unit (7, 8). The silicon chip stages (13, 14) are driven by the single-freedom auxiliary driving units (7, 8) cooperated with the main driving units (11, 12) to move along the X direction.

Abstract: A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (10) operating in an exposure workstation (6) and a silicon chip stage (12) operating in a pre-processing workstation (7). Each silicon chip stage (10, 12) is supported by a six-freedom micro-motion stage, respectively. The silicon chip stage (10, 12) and the six-freedom micro-motion stage form a silicon chip stage group. The two silicon chip stage groups are provided on the same rectangular base stage (1) and suspended on an upper surface (2) of the base sage by air bearings. A double-freedom driving unit (21a, 21b, 22a, 22b) is provided on each edge of the base stage (1), respectively. The six-freedom micro-motion stage of the silicon chip stage group has an upper layer driver and a lower layer driver, capable of achieving six-freedom control.

Abstract: A nanometer precision six-DOF magnetic suspension micro-stage and the application thereof are provided which are mainly used in semiconductor photolithography devices. The micro-stage includes a cross support and four two-DOF actuators. Each 2-DOF actuator comprises a vertically polarized permanent magnet, a horizontal force coil and a vertical force coil; the permanent magnet being mounted on an end of the cross support, the horizontal force coil and the vertical force coil being arranged on a side of and below the permanent magnet respectively and being spaced apart from the permanent magnet; the cross support and four vertically polarized permanent magnets constitute a mover of the micro-stage; the horizontal force coil and the vertical force coil being fixed by a coil framework respectively and constituting a stator of the micro-stage; and the stator being mounted on a base of the micro-stage.

Abstract: A nanometer precision six-DOF magnetic suspension micro-stage and the application thereof are provided which are mainly used in semiconductor photolithography devices. The micro-stage includes a cross support and four two-DOF actuators. Each 2-DOF actuator comprises a vertically polarized permanent magnet, a horizontal force coil and a vertical force coil; the permanent magnet being mounted on an end of the cross support, the horizontal force coil and the vertical force coil being arranged on a side of and below the permanent magnet respectively and being spaced apart from the permanent magnet; the cross support and four vertically polarized permanent magnets constitute a mover of the micro-stage; the horizontal force coil and the vertical force coil being fixed by a coil framework respectively and constituting a stator of the micro-stage; and the stator being mounted on a base of the micro-stage.

Abstract: A two-dimensional locating method of a motion platform based on a magnetic steel array involves the following steps: placing more than four linear Hall sensors at any different positions within one or more polar distances of the magnetic steel array on the surface of the motion platform in a motion system; determining a magnetic flux density distribution model according to the magnetic steel array; determining the mounting positions of the above-mentioned linear Hall sensors, which are converted into phases with respect to the mass center of the motion platform; recording the magnetic flux density measured values of the linear Hall sensors as the motion proceeds; solving the phases of the mass center of the motion platform in a plane, with the measured values being served as observed quantities and the magnetic flux density distribution model being served as a computation model; and determining the position of the mass center of the motion platform with respect to an initial phase according to the phase, so a

Abstract: A dual-stage switching system for lithographic machine includes a wafer stage to be operated in an exposure station and another wafer stage to be operated in a pre-processing station. The two wafer stages are provided on a base, with four 2-DOF driving units capable of moving along X direction and Y direction being provided along the edge of the base, and the wafer stages being disposed in a space surrounded by the four 2-DOF driving units and suspended on an upper surface of the base by air bearings. Each of the 2-DOF driving units includes upper and lower linear guides and a guiding sleeve, with the upper and lower linear guides being installed vertical to each other in their corresponding guiding sleeve. Two adjacent 2-DOF driving units cooperatively drive the wafer stage) to move in the X direction and Y direction.

Abstract: A dual wafer stage exchanging system for a lithographic device is disclosed, said system comprises two wafer stages running between an exposure workstation and a pre-processing workstation, and said two stages are set on a base and suspended above the upper surface of the base by air bearings. Each wafer stages is passed through by a Y-direction guide rail respectively, wherein one end of said guide rail is connected with a main driving unit and another end of said guide rail is detachably coupled with one of the two X-direction auxiliary driving units with single degree of freedom, and said two wafer stages are capable of moving in Y-direction along the guide rails and moving in X-direction under the drive of the auxiliary driving units with single degree of freedom. The position exchange of said two wafer stages can be enabled by the detachment and connection of the Y-direction guide rails and the auxiliary units with single degree of freedom.

Abstract: A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (13) operating in an exposure workstation (3) and a silicon chip (14) stage operating in a pre-processing workstation (4). The two silicon chip stages (13, 14) are provided on the same base stage (1), and suspended on an upper surface (2) of the base stage by air bearings. The two silicon chip stages (13, 14) can move along guide rails (15, 16) in the Y direction. One end of each guide rail (15, 16) is connected to a main driving unit (11, 12), and the other end of each guide rail (15, 16) is butt-jointed with an X-direction single-freedom auxiliary driving unit (7, 8). The silicon chip stages (13, 14) are driven by the single-freedom auxiliary driving units (7, 8) cooperated with the main driving units (11, 12) to move along the X direction.

Abstract: A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (10) operating in an exposure workstation (6) and a silicon chip stage (12) operating in a pre-processing workstation (7). Each silicon chip stage (10, 12) is supported by a six-freedom micro-motion stage, respectively. The silicon chip stage (10, 12) and the six-freedom micro-motion stage form a silicon chip stage group. The two silicon chip stage groups are provided on the same rectangular base stage (1) and suspended on an upper surface (2) of the base sage by air bearings. A double-freedom driving unit (21a, 21b, 22a, 22b) is provided on each edge of the base stage (1), respectively. The six-freedom micro-motion stage of the silicon chip stage group has an upper layer driver and a lower layer driver, capable of achieving six-freedom control.

Abstract: A micro stage with 6 degrees of freedom used in super-precise processing and sensing equipment fields is disclosed. The micro stage has three sets of electromagnetic driving units arranged in a horizontal plane for driving the micro stage to obtain movements within the horizontal plane with 3 degrees of freedom in X, Y and ?z directions and three electromagnetic driving units arranged in a vertical direction for driving the micro stage to obtain additional movements with 3 degrees of freedom in Z, ?x and ?y directions. Direct driving by electromagnetic force is used in the invention. The invention is also applicable in super-precise processing and sensing fields for achieving 6 degree-of-freedom motions. The micro stage, which operates on the basis of Lorentz Law, provides a linear relation between the output pushing force and the input electrical current.

Abstract: A dual-stage switching system for lithographic machine includes a wafer stage to be operated in an exposure station and another wafer stage to be operated in a pre-processing station. The two wafer stages are provided on a base, with four 2-DOF driving units capable of moving along X direction and Y direction being provided along the edge of the base, and the wafer stages being disposed in a space surrounded by the four 2-DOF driving units and suspended on an upper surface of the base by air bearings. Each of the 2-DOF driving units includes upper and lower linear guides and a guiding sleeve, with the upper and lower linear guides being installed vertical to each other in their corresponding guiding sleeve. Two adjacent 2-DOF driving units cooperatively drive the wafer stage) to move in the X direction and Y direction.

Abstract: A micro stage with 6 degrees of freedom used in super-precise processing and sensing equipment filed is disclosed. The micro stage has three sets of electromagnetic driving units arranged in a horizontal plane for driving the micro stage to obtain movements within the horizontal plane with 3 degrees of freedom in X, Y and ?z directions and three electromagnetic driving units arranged in a vertical direction for driving the micro stage to obtain additional movements with 3 degrees of freedom in Z, ?x and ?y directions. Direct driving by electromagnetic force is used in the invention, resulting in advantages over stacked structures of having a simple structure, a compact profile, a low driven weight center, low stator inertia, etc. Thus, there is no mechanical friction and damping, and high displacement resolution can be provided. The positioning error of a wafer table of a lithographic machine can be compensated, and the leveling and focusing of the lithographic machine can be achieved.

Abstract: According to the invention, configurations of X-windings and Y-windings in a synchronous permanent planar motor are improved, X-windings and Y-windings overlap in the direction normal to the planar magnet array and distribute on the entire surface of the thrust core, such that effective wires in the X-windings and Y-windings are lengthened and increased in number, therefore the electromagnetic force generated by the SPMPM of this invention is increased correspondingly; X-windings and Y-windings are mounted on a thrust core made of iron material, thus the electromagnetic force is further increased; in addition, two separated anti-yawing member are provided on the mover for counteracting yawing of the mover, accordingly interference between anti-yawing torque and the electromagnetic force for propelling is eliminated.

Abstract: This invention discloses a scanning mechanism of an ion implanter. The mechanism is a PR-PRR type parallel mechanism with two subchains and two DOFs, driving the wafer holder to scan when the first subchain and the second subchain are translated in the same direction at the same speed and adjusting the rotational angle of the wafer holder when the first moving link (30) and the second moving link (32) in the first subchain and the second subchain have different translation amounts in the same direction or opposite directions. The driving motor for the scanning mechanism is provided outside the implant chamber. The invention also solves problems like low rigidity and large accumulation errors of existing serial scanning mechanisms and the effect of the electromagnetic field of the motor within the ion implant chamber on the trajectory of the ion beam.

Abstract: According to the invention, configurations of X-windings and Y-windings in a synchronous permanent planar motor are improved, X-windings and Y-windings overlap in the direction normal to the planar magnet array and distribute on the entire surface of the thrust core, such that effective wires in the X-windings and Y-windings are lengthened and increased in number, therefore the electromagnetic force generated by the SPMPM of this invention is increased correspondingly; X-windings and Y-windings are mounted on a thrust core made of iron material, thus the electromagnetic force is further increased; in addition, two separated anti-yawing member are provided on the mover for counteracting yawing of the mover, accordingly interference between anti-yawing torque and the electromagnetic force for propelling is eliminated.

Abstract: This invention discloses a scanning mechanism of an ion implanter. The mechanism is a PR-PRR type parallel mechanism with two subchains and two DOFs, driving the wafer holder to scan when the first subchain and the second subchain are translated in the same direction at the same speed and adjusting the rotational angle of the wafer holder when the first moving link (30) and the second moving link (32) in the first subchain and the second subchain have different translation amounts in the same direction or opposite directions. The driving motor for the scanning mechanism is provided outside the implant chamber. The invention also solves problems like low rigidity and large accumulation errors of existing serial scanning mechanisms and the effect of the electromagnetic field of the motor within the ion implant chamber on the trajectory of the ion beam.

Abstract: This invention relates to the parallel structure of a spatial 3-axis machine tool with three degrees of freedom (3 DOF), which have two translational DOF and one rotational DOF. The machine tool includes a base, a mobile platform to which a tool may be attached, and three kinematic legs. Two of the three legs are in a same plane, and each have one 3-DOF spherical joint and two 1-DOF joints. The third leg has one 1-DOF joint and two universal joints. Compared with traditional machine tools, this invention possesses several advantages such as simple structure, high stiffness, low inertia, low cost, and high speed.

Abstract: This invention belongs to the manufacturing fields, specially relates to the structure design of a type of multi-function parallel machine tool driven by sliders and an extensible strut. It includes: two vertical (or one horizontal) guide ways, two active sliders mounted on guide ways, two linear drive units used to move the active sliders, two struts, one movable platform to assemble cutter, one workbench to fix workpiece, one salve slider and one controlled extensible strut. Compared with traditional machine tools, this invention possesses several advantages such as simpler structure, better cutter dexterity, faster cutter feed rate, higher accuracy, and better thermal effect calibration.