Abstract: A method of operation of a content delivery system includes: generating a first user profile for representing a user's identity in a context; generating a second user profile for representing the user's identity in a different context; selecting the first user profile or the second user profile based on the context or the different context; and generating a display content based on the first user profile or the second user profile for displaying on a device.

Abstract: A method of operation of a content delivery system includes: generating a first user profile for representing a user's identity in a context; generating a second user profile for representing the user's identity in a different context; selecting the first user profile or the second user profile based on the context or the different context; and generating a display content based on the first user profile or the second user profile for displaying on a device.

Abstract: A method of operation of a navigation system includes: establishing a recipient response rule for access to a recipient information with a control unit; adjusting the recipient response rule based on a recipient context; processing a task request to access the recipient information based on the recipient response rule; and generating a recipient response to the task request for displaying on a device of the request sender.

Abstract: A method and apparatus are provided for post-CMP cleaning of a semiconductor work piece. The method comprises the steps of subjecting the work piece to a first cleaning composition having one of an acidic pH and a basic pH and subjecting the work piece to a second cleaning composition having an acidic pH, if the first cleaning composition has a basic pH and subjecting the work piece to a second cleaning composition having a basic pH, if the first cleaning composition has an acidic pH.

Abstract: A method and apparatus are provided for post-CMP cleaning of a semiconductor work piece. The method comprises the steps of subjecting the work piece to a first cleaning composition having one of an acidic pH and a basic pH and subjecting the work piece to a second cleaning composition having an acidic pH, if the first cleaning composition has a basic pH and subjecting the work piece to a second cleaning composition having a basic pH, if the first cleaning composition has an acidic pH.

Abstract: A method and apparatus are provided for post-CMP cleaning of a semiconductor work piece. The method comprises the steps of subjecting the work piece to a first cleaning composition having one of an acidic pH and a basic pH and subjecting the work piece to a second cleaning composition having an acidic pH, if the first cleaning composition has a basic pH and subjecting the work piece to a second cleaning composition having a basic pH, if the first cleaning composition has an acidic pH.

Abstract: The invention relates generally to a system and method for improved cleaning of workpieces and workpiece cleaning tools. More specifically, the invention provides systems and methods for cleaning workpieces and sponges by manipulating the surface charge of one or more sponges by exposing them to various cleaning fluids. In one embodiment, sponges such as PVA sponges, having either positive, negative or neutral charges, are used to clean surfaces of workpieces such as semiconductor wafers. While cleaning a workpiece, a sponge may be exposed to a workpiece cleaning fluid, which may or may not alter the surface charge of the sponge. After cleaning the workpiece, the sponge may be exposed to a sponge cleaning fluid, which may or may not alter the surface charge of the sponge.

Abstract: The present invention relates generally to a polyvinyl acetate (PVA) sponge. More specifically, a PVA sponge according to the present invention has certain improved physical characteristics, such as uniform pore size, a microscopically rough surface, and/or a neutral surface charge. Certain characteristics may be achieved by a variety of methods in which pore-forming chemicals are dissolved into a PVA solution, so that no solid residues remain in the pores of a PVA sponge after production. Neutral surface charge of a PVA sponge may be achieved by adding a charge modifying agent during the sponge making process.