Patents by Inventor Guangyu Xia

Guangyu Xia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND APPARATUS FOR REMOVING PARTICLES OR PHOTORESIST ON SUBSTRATES
    Publication number: 20230143401
    Abstract: Methods and an apparatus for removing particles or photoresist on substrates. In an embodiment, a method comprises the following steps: transferring one or more substrates into a DIO3 solution accommodated in a DIO3 bath; after the one or more substrates are processed in the DIO3 bath, taking the one or more substrates out from the DIO3 bath and transferring the one or more substrates into a SPM solution accommodated in a SPM bath; after the one or more substrates are processed in the SPM bath, taking the one or more substrates out from the SPM bath and rinsing the one or more substrates; and transferring the one or more substrates to one or more single chambers to perform single substrate cleaning and drying process. The method combines DIO3 and SPM in one cleaning sequence, which can remove particles or photoresist, especially remove photoresist treated by medium dose or high dose of ion implantation.
    Type: Application
    Filed: April 21, 2020
    Publication date: May 11, 2023
    Applicant: ACM RESEARCH (SHANGHAI), INC.
    Inventors: Xiaoyan Zhang, Wenjun Wang, Fuping Chen, Jun Wang, Shena Jia, Deyun Wang, Hui Wang, Guangyu Xia, He Wang