Patents by Inventor Guannan Sun

Guannan Sun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240136816
    Abstract: A method for quantifying and assessing a scheduling risk considering source load fluctuation and rescheduling, and an apparatus for quantifying and assessing a scheduling risk considering source load fluctuation and rescheduling are provided. The method includes establishing a scene set considering a new energy disturbance; establishing and solving a rescheduling optimization model considering the new energy disturbance in each scene based on a preset scheduling plan according to the scene set, so as to obtain a solving result of the rescheduling optimization model; and calculating a risk quantifying and assessing result corresponding to the preset scheduling plan according to the solving result of the rescheduling optimization model.
    Type: Application
    Filed: April 14, 2023
    Publication date: April 25, 2024
    Inventors: Bin WANG, Guannan WANG, Wenchuan WU, Jun ZHANG, Hongbin SUN, Haitao LIU, Qi WANG, Yanna XI, Jing XING, Ziang LIU, Hongyu ZHANG, Jinhe ZHANG
  • Publication number: 20240084314
    Abstract: A polynucleotide having promoter activity of a malate dehydrogenase gene (mdh gene), a transcription expression cassette, recombinant expression vector and recombinant host cell containing the polynucleotide having the promoter activity, a method for constructing a promoter mutant, a method for regulating the transcription of a target gene, a method for preparing a protein, and method for producing a target compound. The polynucleotide having the promoter activity is a mutant of an mdh gene promoter, and compared with a promoter of a wild-type mdh gene, the promoter activity of the mutant is significantly improved. After operably linking the mutant to a target gene, the expression efficiency of the target gene can be significantly improved, thereby effectively improving the yield and transformation rate of a target compound.
    Type: Application
    Filed: May 24, 2022
    Publication date: March 14, 2024
    Inventors: Ping Zheng, Jiao Liu, Jibin Sun, Guannan Sun, Wenjuan Zhou, Xuan Guo
  • Patent number: 11923685
    Abstract: A reactive power-voltage control method for integrated transmission and distribution networks is provided. The reactive power-voltage control method includes: establishing a reactive power-voltage control model for a power system consisting of a transmission network and a plurality of distribution networks; performing a second order cone relaxation on a non-convex constraint of the plurality of distribution network constraints to obtain the convex-relaxed reactive power-voltage control model; solving the convex-relaxed reactive power-voltage control model to acquire control variables of the transmission network and control variables of each distribution network; and controlling the transmission network based on the control variables of the transmission network and controlling each distribution network based on the control variables of the distribution network, so as to realize coordinated control of the power system.
    Type: Grant
    Filed: June 14, 2021
    Date of Patent: March 5, 2024
    Assignees: TSINGHUA UNIVERSITY, STATE GRID JIBEI ELECTRIC POWER COMPANY
    Inventors: Bin Wang, Yanling Du, Wenchuan Wu, Haitao Liu, Hongbin Sun, Guannan Wang, Qinglai Guo, Qi Wang, Chenhui Lin
  • Publication number: 20240052386
    Abstract: A protein having an L-proline efflux function and the use thereof are provided. A method for producing L-proline or hydroxyproline by means of using a protein ThrE is used for producing L-proline by means of enhancing the activity of a polypeptide, having an L-proline efflux function, in an L-proline-producing strain. Alternatively, the method is used for producing hydroxyproline by means of weakening the activity of a polypeptide, having an L-proline efflux function, in L-proline-producing host cells and enhancing the activity of a proline hydroxylase.
    Type: Application
    Filed: January 11, 2022
    Publication date: February 15, 2024
    Inventors: Jibin SUN, Jiao LIU, Ping ZHENG, Moshi LIU, Yu WANG, Wenjuan ZHOU, Guannan SUN
  • Patent number: 11858093
    Abstract: The present application relates to a composite binding agent grinding wheel, wherein a weight percentage of each raw material of the grinding wheel is: 45-65% of pretreatment abrasive, 8-20% of resin bonding agent, 5-12% of hexagonal boron nitride, 5-10% of silicon dioxide, 5-15% of ceramic powder, 6-12% of prealloy powder bonding agent, and 1-3% of boron powder. The composite binding agent super-hard grinding wheel prepared by the present application can achieve nano-level grinding surface quality when grinding epitaxial wafers, and the grinding wheel has strong self-sharpening and high sharpness. It has obvious advantages in the finishing of silicon carbide crystal epitaxial wafers, which can solve the current limitations of back thinning processing of silicon carbide crystal epitaxial wafers.
    Type: Grant
    Filed: December 17, 2021
    Date of Patent: January 2, 2024
    Assignee: ZHENGZHOU RESEARCH INSTITUTE FOR ABRASIVES & GRINDING CO., LTD.
    Inventors: Yanjun Zhao, Lihua Wang, Gaoliang Zhang, Guanwen Qian, Donghua Zuo, Jianfeng Cao, Guannan Sun
  • Publication number: 20230042029
    Abstract: The present application relates to a composite binding agent grinding wheel, wherein a weight percentage of each raw material of the grinding wheel is: 45-65% of pretreatment abrasive, 8-20% of resin bonding agent, 5-12% of hexagonal boron nitride, 5-10% of silicon dioxide, 5-15% of ceramic powder, 6-12% of prealloy powder bonding agent, and 1-3% of boron powder. The composite binding agent super-hard grinding wheel prepared by the present application can achieve nano-level grinding surface quality when grinding epitaxial wafers, and the grinding wheel has strong self-sharpening and high sharpness. It has obvious advantages in the finishing of silicon carbide crystal epitaxial wafers, which can solve the current limitations of back thinning processing of silicon carbide crystal epitaxial wafers.
    Type: Application
    Filed: December 17, 2021
    Publication date: February 9, 2023
    Inventors: Yanjun Zhao, Lihua Wang, Gaoliang Zhang, Guanwen Qian, Donghua Zuo, Jianfeng Cao, Guannan Sun