Patents by Inventor Guenter Beister

Guenter Beister has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sputtering installation with two longitudinally placed magnetrons
    Patent number: 6361668
    Abstract: A sputtering installation has two longitudinally extended magnetrons disposed next to one another and each has a target on an upper side thereof. Increasing utilization of the targets in the sputtering installation is accomplished by homogenizing the discharge resistance of the magnetrons along the directrix such that a partial discharge resistance of a target point on the directrix has the same magnitude as the partial discharge resistance of a different target point on the directrix.
    Type: Grant
    Filed: March 26, 1999
    Date of Patent: March 26, 2002
    Assignee: Von Ardenne Anlagentechnik GmbH
    Inventors: Johannes Struempfel, Guenter Beister, Wolfgang Erbkamm, Stanley Rehn