Patents by Inventor Guenter Ehrler

Guenter Ehrler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7268436
    Abstract: An electronic device can include a top side with circuit structures. The circuit structures form the bottom region of a cavity. Each cavity can be surrounded by a cavity frame made of plastic and can have a cavity cover made of semiconductor material.
    Type: Grant
    Filed: March 9, 2004
    Date of Patent: September 11, 2007
    Assignee: Infineon Technologies AG
    Inventors: Robert Aigner, Albert Auburger, Frank Daeche, Guenter Ehrler, Andreas Meckes, Horst Theuss, Michael Weber
  • Publication number: 20040201090
    Abstract: An electronic device can include a top side with circuit structures. The circuit structures form the bottom region of a cavity. Each cavity can be surrounded by a cavity frame made of plastic and can have a cavity cover made of semiconductor material.
    Type: Application
    Filed: March 9, 2004
    Publication date: October 14, 2004
    Inventors: Robert Aigner, Albert Auburger, Frank Daeche, Guenter Ehrler, Andreas Meckes, Horst Theuss, Michael Weber
  • Patent number: 5070735
    Abstract: A silicon membrane pressure sensor which has a carrier chip and a membrane chip 3 for which overload protection is desired to protect against the pressure on the front side of the membrane. An overload member 7 is mounted between the carrier chip 2 and the membrane chip 3 such that the overload member is connected to the membrane chip at a middle island portion 5 of the membrane chip 3 and with a first distance D1 from the carrier chip 2 in the non-loaded condition such that when pressure occurs the overload member will remove the load on the membrane chip.
    Type: Grant
    Filed: May 30, 1990
    Date of Patent: December 10, 1991
    Assignee: Siemens Aktiengesellschaft
    Inventors: Hansjoerg Reichert, Karl Platzoeder, Guenter Ehrler
  • Patent number: 4761210
    Abstract: A method for generating patterned structures on a monolith substrate in micro-mechanics to permit the production of at least two successive structurings with the depths required in micro-mechanics. At least two different, selectively removable etching masks which are etchable by different etching agents are applied in sequence to the substrate. A first structuring or patterning step is then employed after the last etching mask has been generated. A further etching step occurs after the removal of the last etching mask through the use of the etching masks then remaining on the substrate. The removal of additional etching masks and generating further structuring steps are repeated until the number of etching steps that have been carried out is the same as the number of etching masks that had been originally present on the monolith substrate.
    Type: Grant
    Filed: June 16, 1986
    Date of Patent: August 2, 1988
    Assignee: Siemens Aktiengesellschaft
    Inventors: Guenter Ehrler, Heinz Hagen, Klaus Becker