Patents by Inventor Guenter Grabosch

Guenter Grabosch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of determining local structures in optical crystals
    Patent number: 6989904
    Abstract: The method for determining local structures in optical materials, especially crystals, includes observing schlieren visually in a material to be tested with divergent white light in a first step; measuring birefringence of polarized laser light in the material to determine local defects and structure faults in the material with a spatial resolution of 0.5 mm or better in a second step if the material is judged to be suitable in the first step and then interferometrically measuring the material to determine the faults in the material by interferometry in a third step if the material is judged to be suitable in the first and second steps. This method can be part of a method for making optical components, especially for microlithography.
    Type: Grant
    Filed: June 18, 2003
    Date of Patent: January 24, 2006
    Assignee: Schott AG
    Inventors: Ewald Moersen, Axel Engel, Christian Lemke, Guenter Grabosch
  • Method of determining local structures in optical crystals
    Publication number: 20040021803
    Abstract: The method for determining local structures in optical materials, especially crystals, includes observing schlieren visually in a material to be tested with divergent white light in a first step; measuring birefringence of polarized laser light in the material to determine local defects and structure faults in the material with a spatial resolution of 0.5 mm or better in a second step if the material is judged to be suitable in the first step and then interferometrically measuring the material to determine the faults in the material by interferometry in a third step if the material is judged to be suitable in the first and second steps. This method can be part of a method for making optical components, especially for microlithography.
    Type: Application
    Filed: June 18, 2003
    Publication date: February 5, 2004
    Inventors: Ewald Moersen, Axel Engel, Christian Lemke, Guenter Grabosch