Patents by Inventor Guenter Maul

Guenter Maul has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device for sealing a projection exposure apparatus
    Patent number: 7130017
    Abstract: A projection exposure apparatus is equipped with an illumination system, a reticle, a projection objective and an image plane. Interstitial spaces between the individual elements of the apparatus are open to the ambient space. A gas purge device which carries a stream of noble gas or nitrogen is arranged in at least one of the interstitial spaces. The gas purge device is of a shape and size so that one or more interstitial spaces are at least to a large extent sealed off from the ambient space surrounding the projection apparatus.
    Type: Grant
    Filed: February 25, 2005
    Date of Patent: October 31, 2006
    Assignee: Carl Zeiss SMT AG
    Inventors: Albrecht Hof, Guenter Maul, Lothar Gail, Wilfried Schierholz, Eberhard Jost
  • Device for holding measurement instruments
    Patent number: 7126692
    Abstract: A device for holding measurement instruments (2), in particular interferometers, is formed from a plurality of structure elements (4, 5, 6, 7) connected to one another and made from at least one material. The at least one material has a very low coefficient of thermal expansion ?. The structure elements (4) on which the measurement instruments (2) are arranged are secured between at least two structure side parts (5) in such a way that the thermal expansions of the structure side parts (5) and of the connections (3) have no effect in the measurement direction of the measurement instruments (2).
    Type: Grant
    Filed: December 15, 2003
    Date of Patent: October 24, 2006
    Assignee: Carl Zeiss SMT AG
    Inventors: Guenter Maul, Norbert Hubig
  • Device for sealing a projection exposure apparatus
    Publication number: 20050206860
    Abstract: A projection exposure apparatus is equipped with an illumination system, a reticle, a projection objective and an image plane. Interstitial spaces between the individual elements of the apparatus are open to the ambient space. A gas purge device which carries a stream of noble gas or nitrogen is arranged in at least one of the interstitial spaces. The gas purge device is of a shape and size so that one or more interstitial spaces are at least to a large extent sealed off from the ambient space surrounding the projection apparatus.
    Type: Application
    Filed: February 25, 2005
    Publication date: September 22, 2005
    Applicant: Carl Zeiss SMT AG
    Inventors: Albrecht Hof, Guenter Maul, Lothar Gail, Wilfried Schierholz, Eberhard Jost
  • Optical system with isolated measuring structure
    Patent number: 6864988
    Abstract: An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical system also has a measuring structure constructed independently of the at least one load-dissipating structure.
    Type: Grant
    Filed: July 1, 2002
    Date of Patent: March 8, 2005
    Assignee: Carl Zeiss Semiconductor Manufacturing Technologies AG
    Inventors: Albrecht Hof, Guenter Maul, Michael Muehlbeyer, Klaus Mehlkopp
  • Device for holding measurement instruments
    Publication number: 20040146336
    Abstract: A device for holding measurement instruments (2), in particular interferometers, is formed from a plurality of structure elements (4, 5, 6, 7) connected to one another and made from at least one material. The at least one material has a very low coefficient of thermal expansion &agr;. The structure elements (4) on which the measurement instruments (2) are arranged are secured between at least two structure side parts (5) in such a way that the thermal expansions of the structure side parts (5) and of the connections (3) have no effect in the measurement direction of the measurement instruments (2).
    Type: Application
    Filed: December 15, 2003
    Publication date: July 29, 2004
    Applicant: Carl Zeiss SMT AG
    Inventors: Guenter Maul, Norbert Hubig
  • Optical system with a plurality of optical elements
    Publication number: 20030010902
    Abstract: An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical system also has a measuring structure constructed independently of the at least one load-dissipating structure.
    Type: Application
    Filed: July 1, 2002
    Publication date: January 16, 2003
    Applicant: CARL-ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
    Inventors: Albrecht Hof, Guenter Maul, Michael Muehlbeyer, Klaus Mehlkopp
  • Optical imaging device, in particular lens system, with at least one system diaphragm
    Patent number: 6445510
    Abstract: An optical imaging device, in particular a lens system, has a system diaphragm (1). An aperture of the system diaphragm (1) is adjustable in its opening diameter (D). The axial position of the aperture of the system diaphragm (1) with respect to the optical axis (4) of the system diaphragm (1) is fixed in dependence on the opening diameter (D) of the system diaphragm (1).
    Type: Grant
    Filed: October 4, 2000
    Date of Patent: September 3, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Karlheinz Schuster, Thomas Bischoff, Bernhard Gellrich, Michael Muehlbeyer, Guenter Maul