Abstract: A method for particle beam-induced processing of a defect of a microlithographic photomask, including the steps of: a) providing an image of at least a portion of the photomask, b) determining a geometric shape of a defect in the image as a repair shape, with the repair shape comprising a number n of pixels, c) subdividing, in computer-implemented fashion, the repair shape into a number k of sub-repair shapes, with an i-th of the k sub-repair shapes having a number mi of pixels, which are a subset of the n pixels of the repair shape, d) providing an activating particle beam and a process gas at each of the mi pixels of a first of the sub-repair shapes for the purposes of processing the first of the sub-repair shapes, e) repeating step d) for the first of the sub-repair shapes over a number j of repetition cycles, and f) repeating steps d) and e) for each further sub-repair shape.

Abstract: Condensation products are prepared from carboxamides, formaldehyde, dicyandiamide and ammonium and/or amine salts in a single process step. After the end of the exothermic reaction the reaction mixture is heated for from 30 minutes to 5 hours at a temperature of from 70.degree. to 100.degree. C.