Patents by Inventor Guenther Kaempf

Guenther Kaempf has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5137799
    Abstract: An electrically conductive resist material is disclosed, comprising at least one polymer which is sensitive to ionizing radiation and a soluble electrically conductive oligomer or polymer. A process for producing the resist material is also described, comprising admixing an electrically conductive oligomer or polymer dissolved in a solvent to at least one polymer which is sensitive to ionizing radiation. The resist material is useful in preparing electron beam resists which prevent electrostatic charging and resultant electrostatic fields.
    Type: Grant
    Filed: February 2, 1990
    Date of Patent: August 11, 1992
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Guenther Kaempf, Michael Feldhues, Ude Scheunemann, Juergen Lingnau
  • Patent number: 4842982
    Abstract: Disclosed is a radiation-sensitive recording material comprising a support, a radiation-sensitive recording layer and a rough covering layer which is applied by spraying and drying a solution which has substantially the same composition as the recording layer. Due to its rough surface, the material provides for accelerated vacuum contact in the copying process. Also disclosed is a process for producing the radiation-sensitive recording material described above.
    Type: Grant
    Filed: June 9, 1987
    Date of Patent: June 27, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Markus Seibel, Guenther Kaempf