Abstract: In an apparatus for the production of coatings with a uniform thickness profile on substrates by cathode sputtering, a substrate carriage held and guided between wheels is provided, which can be moved through the coating chamber, and which has on its side facing the cathode rotatably mounted substrate disks whose axes of rotation are each disposed transversely of the plane of movement of the substrate carriage. On the side of the substrate carriage facing away from the cathode, motor-driven shafts equipped with permanent magnets are journaled in the coating chamber with their longitudinal axes extending in a plane parallel to the plane of movement of the substrate carriage, and they produce a disk current in rotor disks which are affixed co-rotationally to the substrate disks. As a result of the disk current, the rotor disks, and with them the substrate disks, are set in rotation as they pass by the shafts.