Patents by Inventor Guey-Son Chen

Guey-Son Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for improving optical proximity effect in storage node pattern
    Patent number: 6057249
    Abstract: A semiconductor mask has storage node patterns (101a, 101b, 101c, 101d) defining a first region and a second region. Serifs (10) are provided adjacent comers of the storage node patterns for reducing optical proximity effects. Diffraction bars (202) are positioned between the patterns in the first region. In alternative embodiments of the invention, a diffraction bar (702, 802) is situated adjacent patterns that are variously arranged and configured with respect to the diffraction bar.
    Type: Grant
    Filed: April 21, 1998
    Date of Patent: May 2, 2000
    Assignee: Vanguard International Semiconductor Corp.
    Inventor: Guey-Son Chen