Patents by Inventor Guido Constant Simon SCHIFFELERS

Guido Constant Simon SCHIFFELERS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12117730
    Abstract: A method for reducing M3D effects on imaging is described. The method includes identifying points within a source plane of the photolithography system that are associated with pattern shifts resulting from diffraction of light off a photomask under an angle of incidence between an imaging beam of radiation and the mask normal, determining pattern shifts associated with the identified source plane points, and modifying the source to reduce the determined pattern shifts.
    Type: Grant
    Filed: April 7, 2020
    Date of Patent: October 15, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joern-Holger Franke, Eric Henri Jan Hendrickx, Guido Constant Simon Schiffelers
  • Publication number: 20220236645
    Abstract: A method for reducing M3D effects on imaging is described. The method includes identifying points within a source plane of the photolithography system that are associated with pattern shifts resulting from diffraction of light off a photomask under an angle of incidence between an imaging beam of radiation and the mask normal, determining pattern shifts associated with the identified source plane points, and modifying the source to reduce the determined pattern shifts.
    Type: Application
    Filed: April 7, 2020
    Publication date: July 28, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joern-Holger FRANKE, Eric Henri Jan HENDRICKX, Guido Constant Simon SCHIFFELERS