Abstract: A driving mass of an integrated microelectromechanical structure is moved with a rotary motion about an axis of rotation, and a first sensing mass is connected to the driving mass via elastic supporting elements so as to perform a first detection movement in a presence of a first external stress. The driving mass is anchored to an anchorage arranged along the axis of rotation by elastic anchorage elements. An opening is provided within the driving mass and the first sensing mass is arranged within the opening. The elastic supporting and anchorage elements render the first sensing mass fixed to the driving mass in the rotary motion, and substantially decoupled from the driving mass in the first detection movement. A second sensing mass is connected to the driving mass so as to perform a second detection movement in a presence of a second external stress. A first movement is a rotation about an axis lying in a plane, and a second movement is a linear movement along an axis of the plane.

Abstract: An Integrated gyroscope includes a suspended mass; mobile actuation electrodes extending from the suspended mass; and a sensing mass connected to the actuation mass through coupling springs. The suspended mass is formed by an external part and an internal part, electrically separated by an electrical-insulation region having a closed annular shape. The electrical-insulation region is laterally completely surrounded by the external part and by the internal part. In one embodiment, the suspended mass has the shape of a closed frame delimiting an opening, the sensing mass is formed inside the opening and is connected to the internal part, and the mobile actuation electrodes are connected to the external part.

Abstract: Micro-electro-mechanical structure formed by a substrate of semiconductor material and a suspended mass extending above the substrate and separated therefrom by an air gap. An insulating region of a first electrically insulating material extends through the suspended mass and divides it into at least one first electrically insulated suspended region and one second electrically insulated suspended region. A plug element of a second electrically insulating material different from the first electrically insulating material is formed underneath the insulating region and constitutes a barrier between the insulating region and the air gap for preventing removal of the insulating region during fabrication, when an etching agent is used for removing a sacrificial layer and forming the air gap.