Patents by Inventor Guido Limbach
Guido Limbach has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10684551Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.Type: GrantFiled: April 23, 2019Date of Patent: June 16, 2020Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.Inventors: Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz, Guido Limbach, Stefan Hembacher, Holger Walter, Yim-Bun-Patrick Kwan, Markus Hauf, Franz-Josef Stickel, Jan Van Schoot
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Publication number: 20190310555Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.Type: ApplicationFiled: April 23, 2019Publication date: October 10, 2019Inventors: Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz, Guido Limbach, Stefan Hembacher, Holger Walter, Yim-Bun-Patrick Kwan, Markus Hauf, Franz-Josef Stickel, Jan Van Schoot
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Patent number: 10317802Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.Type: GrantFiled: June 20, 2018Date of Patent: June 11, 2019Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.Inventors: Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz, Guido Limbach, Stefan Hembacher, Holger Walter, Yim-Bun-Patrick Kwan, Markus Hauf, Franz-Josef Stickel, Jan Van Schoot
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Patent number: 10203607Abstract: An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.Type: GrantFiled: December 4, 2014Date of Patent: February 12, 2019Assignee: Carl Zeiss SMT GmbHInventors: Tilman Schwertner, Ulrich Bingel, Guido Limbach, Julian Kaller, Hans-Juergen Scherle, Jens Kugler, Dirk Schaffer, Bernhard Gellrich
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Publication number: 20180299784Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.Type: ApplicationFiled: June 20, 2018Publication date: October 18, 2018Inventors: Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz, Guido Limbach, Stefan Hembacher, Holger Walter, Yim-Bun-Patrick Kwan, Markus Hauf, Franz-Josef Stickel, Jan Van Schoot
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Patent number: 10031423Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.Type: GrantFiled: July 14, 2017Date of Patent: July 24, 2018Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.Inventors: Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz, Guido Limbach, Stefan Hembacher, Holger Walter, Yim-Bun-Patrick Kwan, Markus Hauf, Franz-Josef Stickel, Jan Van Schoot
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Publication number: 20180031827Abstract: An optical system has a housing with a mount and an opening to a receiving region, the receiving region being located within the housing and including the mount. At least one optical element is inserted into and removed from the receiving region through the opening, and at least one gas supply device provides a flow of gas in the receiving region. An associated method of inserting or removing an optical element into or from a receiving region in a housing is also disclosed.Type: ApplicationFiled: July 11, 2017Publication date: February 1, 2018Inventors: Guido SOYEZ, Stephan BACK, Joachim BUECHELE, Julian KALLER, Guido LIMBACH, Harald WOELFLE
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Publication number: 20170315449Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.Type: ApplicationFiled: July 14, 2017Publication date: November 2, 2017Inventors: Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz, Guido Limbach, Stefan Hembacher, Holger Walter, Yim-Bun-Patrick Kwan, Markus Hauf, Franz-Josef Stickel, Jan Van Schoot
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Patent number: 9746778Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.Type: GrantFiled: March 15, 2016Date of Patent: August 29, 2017Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.Inventors: Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz, Guido Limbach, Stefan Hembacher, Holger Walter, Yim-Bun-Patrick Kwan, Markus Hauf, Franz-Josef Stickel, Jan Van Schoot
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Patent number: 9703098Abstract: An optical system has a housing with a mount and an opening to a receiving region, the receiving region being located within the housing and including the mount. At least one optical element is inserted into and removed from the receiving region through the opening, and at least one gas supply device provides a flow of gas in the receiving region. An associated method of inserting or removing an optical element into or from a receiving region in a housing is also disclosed.Type: GrantFiled: August 22, 2016Date of Patent: July 11, 2017Assignee: Carl Zeiss SMT GmbHInventors: Guido Soyez, Stephan Back, Joachim Buechele, Julian Kaller, Guido Limbach, Harald Woelfle
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Patent number: 9575224Abstract: A mirror (1a; 1a?; 1b; 1b; 1c; 1c?) with a substrate (S) and a layer arrangement configured such that light (32) having a wavelength below 250 nm and incident on the mirror at at least an angle of incidence of between 0° and 30° is reflected with more than 20% of its intensity. The layer arrangement has at least one surface layer system (P??) having a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include a high refractive index layer (H??) and a low refractive index layer (L??). The layer arrangement has at least one graphene layer. Use of graphene (G, SPL, B) on optical elements reduces surface roughness to below 0.1 nm rms HSFR and/or protects the EUV element against a radiation-induced volume change of more than 1%. Graphene is also employed as a barrier layer to prevent layer interdiffusion.Type: GrantFiled: March 18, 2013Date of Patent: February 21, 2017Assignee: Carl Zeiss SMT GmbHInventors: Rolf Freimann, Norman Baer, Guido Limbach, Thure Boehm, Gero Wittich
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Patent number: 9551944Abstract: A method and a device for replacing objective parts, especially of a projection or illumination objective for microlithography in which an objective having an objective interior and objective parts provided therein is provided. At least one objective part is replaceably accommodated in the objective. Immediately prior to installation in the objective, the replaceable objective part is cleaned outside the objective interior in at least one cleaning room sealed off from the ambient atmosphere. Immediately after cleaning, the replaceable objective is installed in the objective without contact with the normal ambient atmosphere.Type: GrantFiled: August 25, 2014Date of Patent: January 24, 2017Assignee: Carl Zeiss SMT GmbHInventors: Bernhard Geuppert, Guido Limbach, Harald Woelfle, Peter Deufel
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Publication number: 20160357012Abstract: An optical system has a housing with a mount and an opening to a receiving region, the receiving region being located within the housing and including the mount. At least one optical element is inserted into and removed from the receiving region through the opening, and at least one gas supply device provides a flow of gas in the receiving region. An associated method of inserting or removing an optical element into or from a receiving region in a housing is also disclosed.Type: ApplicationFiled: August 22, 2016Publication date: December 8, 2016Inventors: Guido SOYEZ, Stephan BACK, Joachim BUECHELE, Julian KALLER, Guido LIMBACH, Harald WOELFLE
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Patent number: 9423695Abstract: An optical system has a housing with a mount and an opening to a receiving region, the receiving region being located within the housing and including the mount. At least one optical element is inserted into and removed from the receiving region through the opening, and at least one gas supply device provides a flow of gas in the receiving region. An associated method of inserting or removing an optical element into or from a receiving region in a housing is also disclosed.Type: GrantFiled: January 26, 2015Date of Patent: August 23, 2016Assignee: Carl Zeiss SMT GmbHInventors: Guido Soyez, Stephan Back, Joachim Buechele, Julian Kaller, Guido Limbach, Harald Woelfle
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Publication number: 20160195818Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.Type: ApplicationFiled: March 15, 2016Publication date: July 7, 2016Inventors: Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz, Guido Limbach, Stefan Hembacher, Holger Walter, Yim-Bun-Patrick Kwan, Markus Hauf, Franz-Josef Stickel, Jan Van Schoot
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Patent number: 9316929Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.Type: GrantFiled: January 30, 2013Date of Patent: April 19, 2016Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.Inventors: Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz, Guido Limbach, Stefan Hembacher, Holger Walter, Yim-Bun-Patrick Kwan, Markus Hauf, Franz-Josef Stickel, Jan Van Schoot
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Patent number: 9175948Abstract: An optical module, in particular for microlithography, with an optical element unit, a support device, a deformation device and a measuring device is disclosed. The support device is supported on the optical element unit, whereas for deforming an optical surface of the optical element unit, the deformation device engages a deformation section of the optical element unit comprising the optical surface. For determining the position and/or the orientation of the optical element unit with respect to an external reference in at least one degree of freedom, the measuring device comprises at least one measuring element, wherein the measuring element is arranged on a reference section of the optical element unit.Type: GrantFiled: November 4, 2013Date of Patent: November 3, 2015Assignee: Carl Zeiss SMT GmbHInventors: Armin Schoeppach, Stefan Hembacher, Guido Limbach, Jens Kugler
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Publication number: 20150168846Abstract: An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.Type: ApplicationFiled: December 4, 2014Publication date: June 18, 2015Inventors: Tilman Schwertner, Ulrich Bingel, Guido Limbach, Julian Kaller, Hans-Juergen Scherle, Jens Kugler, Dirk Schaffer, Bernhard Gellrich
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Patent number: 9046795Abstract: An optical element unit includes a first optical element module and a sealing arrangement. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially pre-vents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.Type: GrantFiled: March 11, 2008Date of Patent: June 2, 2015Assignee: Carl Zeiss SMT GmbHInventors: Tilman Schwertner, Ulrich Bingel, Guido Limbach, Julian Kaller, Hans-Juergen Scherle, Jens Kugler, Dirk Schaffer, Bernhard Gellrich
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Publication number: 20150138521Abstract: An optical system has a housing with a mount and an opening to a receiving region, the receiving region being located within the housing and including the mount. At least one optical element is inserted into and removed from the receiving region through the opening, and at least one gas supply device provides a flow of gas in the receiving region. An associated method of inserting or removing an optical element into or from a receiving region in a housing is also disclosed.Type: ApplicationFiled: January 26, 2015Publication date: May 21, 2015Inventors: Guido SOYEZ, Stephan BACK, Joachim BUECHELE, Julian KALLER, Guido LIMBACH, Harald WOELFLE