Patents by Inventor Guido Titz

Guido Titz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for the separation of metal ions that are divalent or higher from strong acids or highly acidic media
    Patent number: 10106426
    Abstract: The present invention relates to a method of purifying strong acids or strongly acidic media to remove di- and higher valent metal ions, which can be used within the context of the production of high-purity silica. The invention further relates to the use of special ion exchangers for carrying out the method according to the invention and the resultant high-purity silicas.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: October 23, 2018
    Assignee: Evonik Degussa GmbH
    Inventors: Christian Panz, Florian Paulat, Guido Titz, Sven Müller, Peter Erlhöfer, Markus Ruf, Bodo Frings, Hartwig Rauleder, Thomas Barthel, Mustafa Siray, Jürgen Behnisch
  • HIGH-PURITY SILICON DIOXIDE GRANULES FOR QUARTZ GLASS APPLICATIONS AND METHOD FOR PRODUCING SAID GRANULES
    Publication number: 20170066654
    Abstract: It has been found that conventional cheap waterglass qualities in a strongly acidic medium react to give high-purity silica grades, the treatment of which with a base leads to products which can be processed further to give glass bodies with low silanol group contents.
    Type: Application
    Filed: October 17, 2016
    Publication date: March 9, 2017
    Inventors: Christian Panz, Guido Titz, Sven Müller, Markus Ruf, Bodo Frings, Hartwig Rauleder, Jürgen Behnisch
  • METHOD FOR THE SEPARATION OF METAL IONS THAT ARE DIVALENT OR HIGHER FROM STRONG ACIDS OR HIGHLY ACIDIC MEDIA
    Publication number: 20160207785
    Abstract: The present invention relates to a method of purifying strong acids or strongly acidic media to remove di- and higher valent metal ions, which can be used within the context of the production of high-purity silica. The invention further relates to the use of special ion exchangers for carrying out the method according to the invention and the resultant high-purity silicas.
    Type: Application
    Filed: December 4, 2015
    Publication date: July 21, 2016
    Inventors: Christian Panz, Florian Paulat, Guido Titz, Sven Müller, Peter Erlhöfer, Markus Ruf, Bodo Frings, Hartwig Rauleder, Thomas Barthel, Mustafa Siray, Jürgen Behnisch
  • METHOD FOR THE SEPARATION OF METAL IONS THAT ARE DIVALENT OR HIGHER FROM STRONG ACIDS OR HIGHLY ACIDIC MEDIA
    Publication number: 20140079620
    Abstract: The present invention relates to a method of purifying strong acids or strongly acidic media to remove di- and higher valent metal ions, which can be used within the context of the production of high-purity silica. The invention further relates to the use of special ion exchangers for carrying out the method according to the invention and the resultant high-purity silicas.
    Type: Application
    Filed: February 10, 2012
    Publication date: March 20, 2014
    Applicant: EVONIK DEGUSSA GMBH
    Inventors: Christian Panz, Florian Paulat, Guido Titz, Sven Müller, Peter Erlhöfer, Markus Ruf, Bodo Frings, Hartwig Rauleder, Thomas Barthel, Mustafa Siray, Jürgen Behnisch
  • HIGH-PURITY SILICON DIOXIDE GRANULES FOR QUARTZ GLASS APPLICATIONS AND METHOD FOR PRODUCING SAID GRANULES
    Publication number: 20140072803
    Abstract: It has been found that conventional cheap waterglass qualities in a strongly acidic medium react to give high-purity silica grades, the treatment of which with a base leads to products which can be processed further to give glass bodies with low silanol group contents.
    Type: Application
    Filed: February 10, 2012
    Publication date: March 13, 2014
    Applicant: EVONIK DEGUSSA GMBH
    Inventors: Christian Panz, Guido Titz, Sven Müller, Markus Ruf, Bodo Frings, Hartwig Rauleder, Jürgen Behnisch
  • METHOD FOR PRODUCING HIGH-PURITY SIO2 FROM SILICATE SOLUTIONS
    Publication number: 20110244238
    Abstract: The invention relates to a novel method for producing high-purity SiO2 from silicate solutions, a novel high-purity SiO2 with a specific impurity profile and use thereof.
    Type: Application
    Filed: September 28, 2009
    Publication date: October 6, 2011
    Inventors: Christian Panz, Markus Ruf, Guido Titz, Florian Paulat, Hartwig Rauleder, Sven Müller, Jürgen Behnisch, Jens Peltzer
  • METHOD FOR PRODUCING HIGH-PURITY SIO2 FROM SILICATE SOLUTIONS
    Publication number: 20110236288
    Abstract: The invention relates to a novel method for producing high-purity SiO2 from silicate solutions, a novel high-purity SiO2 having a specific impurity spectrum and use thereof.
    Type: Application
    Filed: September 28, 2009
    Publication date: September 29, 2011
    Inventors: Christian Panz, Markus Ruf, Guido Titz, Florian Paulat, Hartwig Rauleder, Sven Müller, Jürgen Behnish, Jens Peltzer
  • Precipitated silica for thickening and creating thixotropic behavior in liquid systems
    Patent number: 7985292
    Abstract: A precipitated silica having a d50-value of from 150 to 2000 nm, a d90-value of from 500 to 7000 nm, a silanol group density of from 2.5 to 8 OH/nm2, and a modified tapped density of less than or equal to 70 g/l is useful for thickening and providing thixotropy in liquid systems and shows superior efficiency at thickening and creating thixotropy compared to existing grades of precipitated silica. The precipitated silica functions best as a thixotrope in non-polar or intermediate polar liquid systems such as unsaturated polyester (UPE) resin systems.
    Type: Grant
    Filed: November 26, 2007
    Date of Patent: July 26, 2011
    Assignee: Evonik Degussa Corporation
    Inventors: Christian Panz, Karl Meier, James Toth, Guido Titz, Matt Romaine, Mario Scholz
  • NEW PRECIPIATED SILICA FOR THICKENING AND CREATING THIXOTROPIC BEHAVIOR IN LIQUID SYSTEMS
    Publication number: 20090136672
    Abstract: A precipitated silica having a d50-value of from 150 to 2000 nm, a d90-value of from 500 to 7000 nm, a silanol group density of from 2.5 to 8 OH/nm2, and a modified tapped density of less than or equal to 70 g/l is useful for thickening and providing thixotropy in liquid systems and shows superior efficiency at thickening and creating thixotropy compared to existing grades of precipitated silica. The precipitated silica functions best as a thixotrope in non-polar or intermediate polar liquid systems such as unsaturated polyester (UPE) resin systems.
    Type: Application
    Filed: November 26, 2007
    Publication date: May 28, 2009
    Applicant: Evonik Degussa Corporation
    Inventors: Christian Panz, Karl Meier, James Toth, Guido Titz, Matt Romaine, Mario Scholz