Abstract: The present invention relates to a vacuum coating system (01), comprising at least one process chamber (02) that can be evacuated, at least one entry opening (10) and at least one exit opening (11), wherein wafer elements (03), which are coated in the process chamber (02) while passing through, can be fed into and removed from the process chamber through the entry opening (10) and the exit opening (11), and wherein a paddle valve (08, 09), which can be adjusted between an open position and a pressure-tight closed position along a paddle valve closing path, is respectively provided on the entry opening (10) and on the exit opening (11), and wherein for the purpose of transporting the wafer elements (03) a transport system having at least three transport devices (04, 05, 06, 07) is provided, wherein the first transport device (04, 17) is arranged upstream of the entry opening (10), the second transport device (05, 17) is arranged in the process chamber (02) and the third transport device (06, 17) is arranged do