Patents by Inventor Guifu Ding

Guifu Ding has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11440793
    Abstract: Described herein is a hydrogen sensor on medium or low temperature solid micro heating platform, comprising: a substrate; a thermal-insulating layer disposed above the substrate; a heating structure disposed above the thermal-insulating layer, and thermally and electrically isolated from the substrate by the thermal-insulating layer; a thermal-conducting layer covering the heating structure; and a sensitive layer disposed on the thermal-conducting layer. The sensitive layer can be heated to a set temperature by the heating structure to improve sensitivity and reduce the response time.
    Type: Grant
    Filed: December 24, 2019
    Date of Patent: September 13, 2022
    Assignee: Shanghai Jiaotong University
    Inventors: Guifu Ding, Qi Liu, Yan Wang, Yunna Sun
  • Publication number: 20200239300
    Abstract: Described herein is a hydrogen sensor on medium or low temperature solid micro heating platform, comprising: a substrate; a thermal-insulating layer disposed above the substrate; a heating structure disposed above the thermal-insulating layer, and thermally and electrically isolated from the substrate by the thermal-insulating layer; a thermal-conducting layer covering the heating structure; and a sensitive layer disposed on the thermal-conducting layer. The sensitive layer can be heated to a set temperature by the heating structure to improve sensitivity and reduce the response time.
    Type: Application
    Filed: December 24, 2019
    Publication date: July 30, 2020
    Applicant: Shanghai Jiaotong University
    Inventors: Guifu Ding, Qi Liu, Yan Wang, Yunna Sun
  • Publication number: 20140242407
    Abstract: An in-situ compressed specimen of copper interconnection micro column, which is a circular metal column formed in a PDMS hole, includes: a specimen part and a fixed end part for fixing the specimen; wherein the fixed end part is a circular or square plate structure, the specimen part is an upper part of the fixed end part; a main body of the present invention is of micron order, a forced direction of the specimen is consistent with a growth direction of the metal column. A method of electroplating copper column by adopting PDMS as template substrate is applied to overcome a problem that TSV is corrosive to the copper column during a silicon etching process so as to affect a mechanical property accuracy test, the method is advanced in shortening test process period, achieving good reproducibility and high yield.
    Type: Application
    Filed: March 25, 2013
    Publication date: August 28, 2014
    Applicant: Shanghai Jiao Tong University
    Inventors: Hong Wang, Zhaoyu Wang, Ping Cheng, Guifu Ding, Ting Gu, Huiying Wang, Congchun Zhang