Patents by Inventor Guillaume Crinière

Guillaume Crinière has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8822340
    Abstract: A colloidal dispersion for chemical mechanical polishing comprising: (a) an abrasive component; and (b) from about 0.05% to about 10% by weight of the abrasive component, a water-soluble amphoteric polymer comprising at least one macromolecular chain B and a part A bonded to a single end of the at least one macromolecular chain B, wherein the macromolecular chain B is derived from one or more ethylenically unsaturated monomers having quaternary ammonium groups or inium groups, and wherein the part A is a polymeric or nonpolymeric group comprising at least one anionic group; wherein the dispersion has a pH of between about 1.5 and about 6. The colloidal dispersion is capable of polishing a substrate comprising silicon nitride and silicon oxide with a reverse selectivity ratio of at least about 27, typically at least 50 the reverse selectivity ratio being the ratio of the rate of removal of the silicon nitride to the rate of removal of the silicon oxide.
    Type: Grant
    Filed: January 3, 2013
    Date of Patent: September 2, 2014
    Assignees: Rhodia Operations, Clarkson University—Division of Research
    Inventors: Suryadevara V. Babu, Pradeepa Dandu, Vamsi K. Devarapalli, Guillaume Criniere, Claire Pitois
  • Patent number: 8623778
    Abstract: Catalyst compositions include finely divided nanoscale particles of at least one supported oxide selected from among zirconium oxide, titanium oxide or a mixed zirconium/titanium oxide deposited onto an alumina-based or aluminum-oxyhydroxide-based support, wherein, after calcination for 4 hours at 900° C., the at least one support oxide is in the form of nanoscale particles deposited onto the support, the size of said particles being at most 10 nm when the at least one supported oxide is based is zirconium oxide and being at most 15 nm when the at least one supported oxide is titanium oxide or a mixed zirconium/titanium oxide; such catalyst compositions are especially useful for the selective reduction of NOx.
    Type: Grant
    Filed: February 23, 2009
    Date of Patent: January 7, 2014
    Assignee: Rhodia Operations
    Inventors: Stephan Verdier, Guillaume Criniere, Simon Ifrah, Rui Jorge Coelho Marques
  • Patent number: 8563462
    Abstract: Catalyst compositions include finely divided nanoscale particles of at least one supported oxide, based on a zirconium oxide, a titanium oxide or a mixed zirconium/titanium oxide deposited onto a silica based support, wherein, after calcination for 4 hours at 900° C., the supported oxide is in the form of nanoscale particles deposited onto the support, the size of the particles being at most 5 nm when the at least one supported oxide is based on a zirconium oxide, being at most 10 nm when the at least one supported oxide is based on a titanium oxide and being at most 8 nm when the at least one supported oxide is based on a mixed zirconium/titanium oxide; such catalyst compositions are especially useful for the selective reduction of NOx.
    Type: Grant
    Filed: February 23, 2009
    Date of Patent: October 22, 2013
    Assignee: Rhodia Operations
    Inventors: Stephan Verdier, Guillaume Criniere, Simon Ifrah, Rui Jorge Coelho Marques
  • Publication number: 20130122705
    Abstract: A colloidal dispersion for chemical mechanical polishing comprising: (a) an abrasive component; and (b) from about 0.05% to about 10% by weight of the abrasive component, a water-soluble amphoteric polymer comprising at least one macromolecular chain B and a part A bonded to a single end of the at least one macromolecular chain B, wherein the macromolecular chain B is derived from one or more ethylenically unsaturated monomers having quaternary ammonium groups or inium groups, and wherein the part A is a polymeric or nonpolymeric group comprising at least one anionic group; wherein the dispersion has a pH of between about 1.5 and about 6. The colloidal dispersion is capable of polishing a substrate comprising silicon nitride and silicon oxide with a reverse selectivity ratio of at least about 27, typically at least 50 the reverse selectivity ratio being the ratio of the rate of removal of the silicon nitride to the rate of removal of the silicon oxide.
    Type: Application
    Filed: January 3, 2013
    Publication date: May 16, 2013
    Applicants: Clarkson University, Rhodia Operations
    Inventors: Suryadevara V. BABU, Pradeepa DANDU, Vamsi K. DEVARAPALLI, Guillaume CRINIERE, Claire PITOIS
  • Patent number: 8366959
    Abstract: A colloidal dispersion for chemical mechanical polishing comprising: (a) an abrasive component; and (b) from about 0.05% to about 10% by weight of the abrasive component, a water-soluble amphoteric polymer comprising at least one macromolecular chain B and a part A bonded to a single end of the at least one macromolecular chain B, wherein the macromolecular chain B is derived from one or more ethylenically unsaturated monomers having quaternary ammonium groups or inium groups, and wherein the part A is a polymeric or nonpolymeric group comprising at least one anionic group; wherein the dispersion has a pH of between about 1.5 and about 6. The colloidal dispersion is capable of polishing a substrate comprising silicon nitride and silicon oxide with a reverse selectivity ratio of at least about 27, typically at least 50 the reverse selectivity ratio being the ratio of the rate of removal of the silicon nitride to the rate of removal of the silicon oxide.
    Type: Grant
    Filed: September 25, 2009
    Date of Patent: February 5, 2013
    Assignees: Rhodia Operations, Clarkson University
    Inventors: Suryadevara V. Babu, Pradeepa Dandu, Vamsi K Devarapalli, Guillaume Crinière, Claire Pitois
  • Publication number: 20120328500
    Abstract: Compositions useful for treating the exhaust gases of diesel engines contain zirconium oxide, silicon oxide and at least one oxide of at least one element M selected from among titanium, aluminum, tungsten, molybdenum, cerium, iron, tin, zinc, and manganese, in the following mass proportions of these different elements: silicon oxide: 5%-30%; M-element oxide: 1%-20%; the balance being zirconium oxide; such compositions also have an acidity, as measured by the methylbutynol test, of at least 90% and are prepared by placing a zirconium compound, a silicon compound, at least one M-element compound and a basic compound in a liquid medium, thereby generating a precipitate, maturing the precipitate in a liquid medium and separating and calcining the precipitate.
    Type: Application
    Filed: September 5, 2012
    Publication date: December 27, 2012
    Applicants: MAGNESIUM ELEKTRON LIMITED, RHODIA OPERATIONS
    Inventors: Olivier LARCHER, Emmanuel ROHART, Stephan VERDIER, Heather BRADSHAW, Clive BUTLER, Deborah HARRIS, Mairead FEELEY, Guillaume CRINIERE
  • Patent number: 8317888
    Abstract: Suspensions of cerium oxide particles in which the particles (secondary particles) have an average size not exceeding 200 nm, such secondary particles being comprised of primary particles having an average size not exceeding 100 nm with a standard deviation having a value not exceeding 30% of the value of this average size, are prepared from a solution of a cerium-III salt, including cerium IV or hydrogen peroxide, which is contacted with a base in the presence of nitrate ions and in an inert atmosphere; the medium thus obtained is subjected to a thermal processing in an inert atmosphere, then acidified and scrubbed and the powder is obtained by drying and calcining of the suspension, which suspension and powder are useful for polishing applications.
    Type: Grant
    Filed: October 4, 2007
    Date of Patent: November 27, 2012
    Assignee: Rhodia Operations
    Inventor: Guillaume Criniere
  • Patent number: 8293829
    Abstract: Colloidal dispersions of inorganic particles in a liquid phase include ampholytic copolymers containing at least one macromolecular chain B and a moiety A bonded to a single end thereof and in which the macromolecular chain B includes cationic units Bc, deriving from cationic monomers Bc and the moiety A is a polymeric or non-polymeric group containing at least one anionic or potentially anionic group; such dispersions may have a positive zeta potential within a pH ranging from 1 to 11.
    Type: Grant
    Filed: October 29, 2008
    Date of Patent: October 23, 2012
    Assignee: Rhodia Operations
    Inventors: Guillaume Criniere, Claire Pitois, Mathias Destarac
  • Publication number: 20110225897
    Abstract: Suspensions of cerium oxide particles, well suited for polishing applications, the particles (secondary particles) of which have an average size of at most 200 nm, these secondary particles are formed from primary particles whose average size measured by TEM is at most 150 nm with a standard deviation of at most 30% of the value of this average size, and for which the ratio of the average size measured by TEM to the average size measured by BET is at least 1.5. Such suspensions are prepared from solutions of a cerium III salt, comprising a colloidal dispersion of cerium IV, which are contacted, in the presence of nitrate ions and under an inert atmosphere, with a base, and the medium obtained is subjected to a thermal treatment under an inert atmosphere and then acidified and washed.
    Type: Application
    Filed: July 7, 2009
    Publication date: September 22, 2011
    Applicant: RHODIA OPERATIONS
    Inventors: Guillaume Criniere, Laurent Thiers
  • Publication number: 20110053763
    Abstract: Catalyst compositions include finely divided nanoscale particles of at least one supported oxide selected from among zirconium oxide, titanium oxide or a mixed zirconium/titanium oxide deposited onto an alumina-based or aluminum-oxyhydroxide-based support, wherein, after calcination for 4 hours at 900° C., the at least one support oxide is in the form of nanoscale particles deposited onto the support, the size of said particles being at most 10 nm when the at least one supported oxide is based is zirconium oxide and being at most 15 nm when the at least one supported oxide is titanium oxide or a mixed zirconium/titanium oxide; such catalyst compositions are especially useful for the selective reduction of NOx.
    Type: Application
    Filed: February 23, 2009
    Publication date: March 3, 2011
    Applicant: RHODIA OPERATIONS
    Inventors: Stephan Verdier, Guillaume Criniere, Simon Ifrah, Rui Jorge Coelho Marques
  • Publication number: 20110045967
    Abstract: Catalyst compositions include finely divided nanoscale particles of at least one supported oxide, based on a zirconium oxide, a titanium oxide or a mixed zirconium/titanium oxide deposited onto a silica based support, wherein, after calcination for 4 hours at 900° C., the at least one supported oxide is in the form of nanoscale particles deposited onto the support, the size of the particles being at most 5 nm when the at least one supported oxide is based on a zirconium oxide, being at most 10 nm when the at least one supported oxide is based on a titanium oxide and being at most 8 nm when the at least one supported oxide is based on a mixed zirconium/titanium oxide; such catalyst compositions are especially useful for the selective reduction of NOx.
    Type: Application
    Filed: February 23, 2009
    Publication date: February 24, 2011
    Inventors: Stephan Verdier, Guillaume Criniere, Simon Ifrah, Rui Jorge Coelho Marques
  • Publication number: 20110033352
    Abstract: Compositions based on zirconium oxide, including 1 to 20% yttrium oxide, 1 to 30% tungsten oxide and the balance zirconium oxide, have a specific surface area of at least 40 m2/g after calcination at 700° C. for 4 hours and an acidity measured by the methylbutynol test of at least 90%, and are useful as catalyst or catalyst supports, especially for the treatment of motor vehicle exhaust gases.
    Type: Application
    Filed: January 6, 2009
    Publication date: February 10, 2011
    Applicant: RHODIA OPERATIONS
    Inventors: Olivier Larcher, Emmanuel Rohart, Stephan Verdier, Guillaume Criniere, Deborah Harris, Heather Bradshaw
  • Publication number: 20110009552
    Abstract: Colloidal dispersions of inorganic particles in a liquid phase include ampholytic copolymers containing at least one macromolecular chain B and a moiety A bonded to a single end thereof and in which the macromolecular chain B includes cationic units Bc, deriving from cationic monomers Bc and the moiety A is a polymeric or non-polymeric group containing at least one anionic or potentially anionic group; such dispersions may have a positive zeta potential within a pH ranging from 1 to 11.
    Type: Application
    Filed: October 29, 2008
    Publication date: January 13, 2011
    Inventors: Guillaume Criniere, Claire Pitois, Mathias Destarac
  • Publication number: 20100247407
    Abstract: Compositions useful for treating the exhaust gases of diesel engines contain zirconium oxide, silicon oxide and at least one oxide of at least one element M selected from among titanium, aluminum, tungsten, molybdenum, cerium, iron, tin, zinc, and manganese, in the following mass proportions of these different elements: silicon oxide: 5%-30%; M-element oxide: 1%-20%; the balance being zirconium oxide; such compositions also have an acidity, as measured by the methylbutynol test, of at least 90% and are prepared by placing a zirconium compound, a silicon compound, at least one M-element compound and a basic compound in a liquid medium, thereby generating a precipitate, maturing the precipitate in a liquid medium and separating and calcining the precipitate.
    Type: Application
    Filed: October 19, 2007
    Publication date: September 30, 2010
    Applicants: RHODIA OPERATIONS, MAGNESIUM ELEKTRON LIMITED
    Inventors: Olivier Larcher, Emmanuel Rohart, Stephan Verdier, Heather Bradshaw, Clive Butler, Deborah Harris, Mairead Feeley, Guillaume Criniere
  • Publication number: 20100081281
    Abstract: A colloidal dispersion for chemical mechanical polishing comprising: (a) an abrasive component; and (b) from about 0.05% to about 10% by weight of the abrasive component, a water-soluble amphoteric polymer comprising at least one macromolecular chain B and a part A bonded to a single end of the at least one macromolecular chain B, wherein the macromolecular chain B is derived from one or more ethylenically unsaturated monomers having quaternary ammonium groups or inium groups, and wherein the part A is a polymeric or nonpolymeric group comprising at least one anionic group; wherein the dispersion has a pH of between about 1.5 and about 6. The colloidal dispersion is capable of polishing a substrate comprising silicon nitride and silicon oxide with a reverse selectivity ratio of at least about 27, typically at least 50 the reverse selectivity ratio being the ratio of the rate of removal of the silicon nitride to the rate of removal of the silicon oxide.
    Type: Application
    Filed: September 25, 2009
    Publication date: April 1, 2010
    Applicants: RHODIA OPERATIONS, CLARKSON UNIVERSITY
    Inventors: Suryadevara V. Babu, Pradeepa Dandu, Vamsi K. Devarapalli, Guillaume Criniere, Claire Pitois
  • Publication number: 20100072417
    Abstract: Suspensions of cerium oxide particles in which the particles (secondary particles) have an average size not exceeding 200 nm, such secondary particles being comprised of primary particles having an average size not exceeding 100 nm with a standard deviation having a value not exceeding 30% of the value of this average size, are prepared from a solution of a cerium-III salt, including cerium IV or hydrogen peroxide, which is contacted with a base in the presence of nitrate ions and in an inert atmosphere; the medium thus obtained is subjected to a thermal processing in an inert atmosphere, then acidified and scrubbed and the powder is obtained by drying and calcining of the suspension, which suspension and powder are useful for polishing applications.
    Type: Application
    Filed: October 4, 2007
    Publication date: March 25, 2010
    Inventor: Guillaume Criniere